2017
DOI: 10.1177/1847980417735702
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Impact of thermal oxidation on the structural and optical properties of porous silicon microcavity

Abstract: We report the structural and optical characterization of one-dimensional porous silicon microcavities. These structures are based on a planar resonator formed by two high-reflectance mirrors separated by a thin active optical spacer. In order to simulate and predict the optical properties of the microcavity, the transfer matrix method is used. A strong correlation between the formation parameters and the reflectance spectra is introduced. The prepared microcavities are exposed to thermal oxidation. The resonan… Show more

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Cited by 7 publications
(4 citation statements)
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“…This blue shift of 57 nm is due to the transformation of Si to SiO 2 , which results in a reduction in the refractive index from 3.5 for Si to 1.4 for amorphous SiO 2 [ 47 ]. Therefore, the shift in the reflectance spectrum upon thermal treatment is consistent with the formation of SiO 2 , in full agreement with previous studies [ 48 , 49 ].…”
Section: Resultssupporting
confidence: 92%
See 1 more Smart Citation
“…This blue shift of 57 nm is due to the transformation of Si to SiO 2 , which results in a reduction in the refractive index from 3.5 for Si to 1.4 for amorphous SiO 2 [ 47 ]. Therefore, the shift in the reflectance spectrum upon thermal treatment is consistent with the formation of SiO 2 , in full agreement with previous studies [ 48 , 49 ].…”
Section: Resultssupporting
confidence: 92%
“…pSiRF sensors were prepared via electrochemical etching of p-type Si (100) wafers in ethanolic hydrofluoric acid by modulating the current density in a sinusoidal manner. The morphology of a typical pSiRF sensor after the subsequently applied thermal oxidation process [ 48 ] is shown in the top view FESEM micrograph in Figure 1 a. This image shows nanopores that are randomly distributed across the surface.…”
Section: Resultsmentioning
confidence: 99%
“…However, the experimental reflection spectrum with its theoretical reflection spectrum did not show a good agreement. MCs were oxidized at different temperature for 5 minutes and a wavelength shift to low wavelengths was observed 47 .…”
Section: Porous Silicon Microcavities On Silicon Substrates and Quartmentioning
confidence: 99%
“…To achieve such SiO 2 layer, several techniques have been applied, such as thermal oxidation or chemical oxidation, being the former the most used. It consists in converting Si into SiO 2 by thermolysis at temperatures below 950°C, to avoid the modification of the shape of the structure [104][105][106] (see Figure 2.13). In this work, pSi was oxidised using a tube furnace CTF 12 (Carbolite Gero Ltd, Sheffield, United Kingdom).…”
Section: Oxidation Of Psimentioning
confidence: 99%