Optical and EUV Nanolithography XXXVI 2023
DOI: 10.1117/12.2658651
|View full text |Cite
|
Sign up to set email alerts
|

Importance sampling in Gaussian random field EUV stochastic model for quantification of stochastic variability of EUV vias

Abstract: Importance Sampling methods allow to substantially reduce the number of trials in estimation of the rare failure probability or other stochastic metrics. These methods can be viewed as a rigorous generalization of quantitative "torture" or "stress" methods where the process is artificially modified to increase the probability of failure, and the failure probability estimations obtained for such modified process are extrapolated to the original process with rare failures. Applications of Importance Sampling met… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
2
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
1
1

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 11 publications
(44 reference statements)
0
2
0
Order By: Relevance
“…The parameters and the modeling assumptions of these test cases are as used in our earlier work 4,9 . In both test examples we use the simplified imaging model to calculate the EUV image in resist.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The parameters and the modeling assumptions of these test cases are as used in our earlier work 4,9 . In both test examples we use the simplified imaging model to calculate the EUV image in resist.…”
Section: Resultsmentioning
confidence: 99%
“…10) where ()  x is absorbance coefficient of the resist material, ()Ix is the intensity of EUV image in resist, () G x is a deprotection kernel of the resist process model, one of the functional parameters of the stochastic resist model, h N  is the average number of photons absorbed in the entire simulation area, V , for the given exposure dose, image in resist and the absorbance coefficient. Finally, x x is the normalization coefficient in the probability density function (PDF) of the EUV photon absorption site distribution.This covariance function can be used to calculate the KLE eigenvalues and eigenfunctions, without the need to perform Monte Carlo trials for its estimation.One additional important simplification of KLE in the case of EUVL stochastic model with a GRF deprotection comes from noticing that the random variables to the GRF deprotection through(9), form a joint multivariate normal distribution. Because these random variables are uncorrelated and have a unit variance (as guaranteed by KLE, per (8)), their covariance matrix and its inverse are both identity matrices.…”
mentioning
confidence: 99%