“…10) where () x is absorbance coefficient of the resist material, ()Ix is the intensity of EUV image in resist, () G x is a deprotection kernel of the resist process model, one of the functional parameters of the stochastic resist model, h N is the average number of photons absorbed in the entire simulation area, V , for the given exposure dose, image in resist and the absorbance coefficient. Finally, x x is the normalization coefficient in the probability density function (PDF) of the EUV photon absorption site distribution.This covariance function can be used to calculate the KLE eigenvalues and eigenfunctions, without the need to perform Monte Carlo trials for its estimation.One additional important simplification of KLE in the case of EUVL stochastic model with a GRF deprotection comes from noticing that the random variables to the GRF deprotection through(9), form a joint multivariate normal distribution. Because these random variables are uncorrelated and have a unit variance (as guaranteed by KLE, per (8)), their covariance matrix and its inverse are both identity matrices.…”