Imprint strategy for directed self-assembly of block copolymers

Mayer, André; Blenskens, Dainel; Rond, Johannes; Steinberg, Christian; Papenheim, Marc; Wang, Si; Zajadacz, Joachim; Zimmer, Klaus; Scheer, Hella-Christin

doi:10.1016/j.mee.2017.02.003

Cited by 3 publications

(2 citation statements)

References 32 publications

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“…Reports on topographic structuring of BCP films 38 with contact lithography mostly describe the utilization of nanoimprint lithography, which was applied to effect long-range ordering of the periodic nanodomains formed by microphase separation. [39][40][41][42][43][44][45][46] Soft lithography techniques were applied for transfer-printing BCP films or micellar BCP films inked on the elastomeric stamp, [47][48][49] micro-transfer molding (i.e., transfer a BCP solution or film confined in the grooves of the stamp onto a substrate), 50,51 and micromolding in capillaries (i.e., drawing a BCP solution by capillary forces into channels formed by the stamp and the substrate it is placed on). 3,52 Capillary force lithography, i.e., the direct application of an elastomeric stamp to an existing BCP film in order to structure it topographically, was also reported, 19,53,54 and was aimed at obtaining longrange ordering.…”

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Coupling the chemistry and topography of block copolymer films patterned by soft lithography for nanoparticle organization

2022

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Coupling the chemistry and topography of block copolymer films patterned by soft lithography for nanoparticle organization

2022

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Research and development of the replication process of dynamic tilting magnetic colloid soft mold deforming imprint

Weng

Wang

2019

Microelectronic Engineering

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Electrically-assisted nanoimprint of block copolymers

Mayer

Rond

et al. 2018

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Guiding of the phase separation of a block copolymer (BCP) by an electric field perpendicular to the substrate is investigated in order to obtain vertical structures that can provide a mask for subsequent etching. Because of practical aspects, the substrate is bare Si without any neutral brush and the process time is limited to 1 h. A polystyrene-block polymethylmethacrylate lamellar material is employed in the study. For a unique guiding of the lamellar phase, an ordering mechanism orthogonal to the electric field is introduced by the interaction with the stamp in a thermal nanoimprint process. The naturally low surface energy of the stamp shall induce the formation of lamellae along the sidewalls of linear cavities. In order to fully utilize these two ordering mechanisms, the stamp sidewalls and the electric field, the imprint process is conducted in such a way that no residual layer remains below the stamp structures and the whole BCP is accumulated inside the cavities which are just partly filled. The electrically-assisted imprint process is studied analytically, considering the capacitive effects due to the local electric field in the cavity and in particular in the BCP. In addition, a numerical simulation is performed for the actual experimental conditions to compute the electric vector field in the BCP. In this way, an extensive understanding of the situation is gained which is the basis for choosing optimal experimental conditions for electrically-assisted thermal nanoimprint. Furthermore, the ambiguity of the electric field in a thermal nanoimprint process with partly filled cavities is addressed. The field shall induce vertical phase separation but, due to instabilities, it also may induce capillary bridges that represent replication defects. An improvement of the vertical phase separation by applying an electric field as high as 25 V/μm could be identified under specific experimental conditions. However, the guiding effect within the cavities and thus the long-range order of the lamellae remained limited. This may be due to a field strength too low in the BCP; in the present configuration, higher field strengths are prohibited by an electrical breakthrough.

show abstract

Imprint strategy for directed self-assembly of block copolymers

Cited by 3 publications

References 32 publications

Coupling the chemistry and topography of block copolymer films patterned by soft lithography for nanoparticle organization

Coupling the chemistry and topography of block copolymer films patterned by soft lithography for nanoparticle organization

Research and development of the replication process of dynamic tilting magnetic colloid soft mold deforming imprint

Electrically-assisted nanoimprint of block copolymers

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