2019
DOI: 10.1016/j.sna.2018.12.027
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Improved galvanic porous silicon fabrication using patterned electrodes

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Cited by 2 publications
(3 citation statements)
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“…Certainly, at ambient temperature, humid air, a low boiling temperature (or high vapor pressure) and a low enthalpy of vaporization are necessary requirements that cause the condensation of droplets on the solution [10,11] but this is not sufficient to explain the observed results. For example, Acetone has a low boiling point and similar enthalpy of vaporization than that of chloroform but doesn't lead to the formation of Breath Figure . In literature [11,12,13] BF films can be produced with solvents having lower or greater density than water but according to our experiment BF was obtained with high density solvent(chloroform). It also has been reported that porous film can be generated with chloroform which is immiscible or poorly miscible with water.…”
Section: Characterization Methodsmentioning
confidence: 99%
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“…Certainly, at ambient temperature, humid air, a low boiling temperature (or high vapor pressure) and a low enthalpy of vaporization are necessary requirements that cause the condensation of droplets on the solution [10,11] but this is not sufficient to explain the observed results. For example, Acetone has a low boiling point and similar enthalpy of vaporization than that of chloroform but doesn't lead to the formation of Breath Figure . In literature [11,12,13] BF films can be produced with solvents having lower or greater density than water but according to our experiment BF was obtained with high density solvent(chloroform). It also has been reported that porous film can be generated with chloroform which is immiscible or poorly miscible with water.…”
Section: Characterization Methodsmentioning
confidence: 99%
“…During the breath figure process, the regularity of pore array mainly concerns with the substrate or surface where the polymer solution is casted [9][10][11][12][13]. It is not understood yet, how substrate effects on the BFA formation and why.…”
Section: Substratementioning
confidence: 99%
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