Improved laser induced damage thresholds of Ar ion implanted fused silica at different ion fluences

Abstract

Qing (2019) Improved laser induced damage thresholds of Ar ion implanted fused silica at different ion fluences. Applied Surface Science, 471. pp. 786-794.

Correlated accumulation of microcracks in impact damaged surface of α-quartz amorphized by Ar-=SUP=-+-=/SUP=- ions implantation

“…This effect can be explained by surface densifying of SiO 2 and silicate glasses at ions implantation [6][7][8], that shortens the development of damaging process. Molecular mechanism of compaction induced by ions consists in reduction of angles of Si−O−Si with formation of 3-and 4-membered siloxane rings [9].…”

Коррелированное накопление микротрещин при ударном повреждении поверхности α-кварца, аморфизованной имплантацией ионами Ar-=SUP=-+-=/SUP=-

“…Заметно, что в генерация АЭ из имплантированного слоя значительно более кратковременна, чем с нетронутой поверхности. Этот эффект можно объяснить уплотнением поверхности SiO 2 и силикатных стекол при внедрении ионов [6][7][8], что сокращает развитие процесса повреждения. Молекулярный механизм наведенной ионами компактизации заключается в уменьшении углов Si−O−Si с образованием 3-и 4-членных силоксановых колец [9].…”

Study on Damage Characteristics of Fused Silica under Ion Beam Sputtering and AMP Technique

“…e noncontact processing model enables IBSE technique not to introduce defects such as pollution and scratches, so as to achieve the goal of manufacturing optical elements with high surface quality and damage threshold. By studying the surface modification, Li found that IBSE can effectively improve the surface state of fused silica, and the damage threshold could reach more than 15 J/cm 2 [12,13]. Liao detected fused silica surface polished by IBSE technique with high-resolution methods such as atomic force microscope and found that no defects generate on the surface, which proved the effectiveness of the technique [14].…”