Keywords: perovskite oxide interface, pulsed laser deposition, LaAlO 3 /SrTiO 3 , atomic layer engineering, epitaxial strain 2 The two-dimensional (2D) conducting interface between LaAlO 3 (LAO) and SrTiO 3 (STO) -both perovskite oxide band insulators -has attracted immense attention since its discovery by Ohtomo and Hwang. [1] Several unexpected physical properties have been experimentally observed, [2,3] which stimulated numerous theoretical investigations. [4][5][6] However, despite intense research, the exact origin of such remarkable behavior remains to be understood. While the polar catastrophe model at the interface between a polar (LAO) and a non-polar (STO) oxide provides an appealing explanation for the characteristics of this system, [7] the role of extrinsic factors such as oxygen vacancies and/or cation intermixing in producing similar behavior cannot be ruled out. [8][9][10][11][12][13][14][15] Pulsed laser deposition (PLD) is the most frequently used method for fabricating LAO/STO heterostructures. It is generally understood that, among the various growth parameters, the background gas pressure and the substrate temperature have the greatest influence on the film quality. Under optimal conditions -i.e., when the oxygen partial pressure P(O 2 ) is used to tune the kinetic energy of growth species in the laser-induced plume -single crystal thin films with atomically smooth surfaces can be grown. [16] However, at less than optimal growth conditions, the highly energetic plume-substrate interactions can produce undesirable departures from stoichiometry. [17,18] As summarized in Table 1 of Supporting Information, the PLD growth conditions used in published reports on the LAO/STO interface formation were not uniform, suggesting that the differences in the growth parameters might contribute to inconsistent observations and/or interpretations of interface conductivity. Most importantly, compared to conventional PLD growth conditions for typical perovskite oxides, [19,20] many LAO/STO heterostructures were grown at unusually low P(O 2 ) and rather high temperatures.
3The selective use of low P(O 2 ) in the early stage of LAO/STO growth raises an intriguing question: what if instead very high P(O 2 ) was used to grow the LAO film? It was shown that LAO/STO growth at low P(O 2 ) easily generates a high concentration of oxygen vacancies, [8][9][10][11] and post-annealing in a high-pressure oxygen ambient was found to reduce their number. [3,8,9] Interestingly, some previous work reported good metallic conduction even after post-annealing, suggesting that the contribution of oxygen vacancies to the electronic conduction is negligible. [1,7,21] It should be further noted that the energetic process of PLD -i.e., species are transported from the target to the substrate with a high kinetic energy -may substantially influence the formation of cation off-stoichiomety, resulting in a chemically broadened interface. [12][13][14][15] Here again, the P(O 2 ) should have a strong influence on interface formation, but onl...