2020
DOI: 10.1007/s00339-020-3421-z
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Improved structural and optical properties of β-Ga2O3 films by face-to-face annealing

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Cited by 6 publications
(4 citation statements)
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“…As the reaction time increases, the absorption edge shifts to a longer wavelength and then a shorter wavelength. As a direct band gap semiconductor material, the optical band gap ( E g ) can be calculated via the adsorption spectra using a Tauc plot according to the following equation: 59–61 ( αhν ) 2 = A ( hν − E g )where α is the absorption coefficient, hν is the incident photon energy, and A is a constant. The E g of the Ga 2 O 3 microspheres can be extracted by extrapolating the linear region of ( αhν ) 2 to hν , as shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…As the reaction time increases, the absorption edge shifts to a longer wavelength and then a shorter wavelength. As a direct band gap semiconductor material, the optical band gap ( E g ) can be calculated via the adsorption spectra using a Tauc plot according to the following equation: 59–61 ( αhν ) 2 = A ( hν − E g )where α is the absorption coefficient, hν is the incident photon energy, and A is a constant. The E g of the Ga 2 O 3 microspheres can be extracted by extrapolating the linear region of ( αhν ) 2 to hν , as shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…As the reaction time increases, the absorption edge shifts to a longer wavelength and then a shorter wavelength. As a direct band gap semiconductor material, the optical band gap (E g ) can be calculated via the adsorption spectra using a Tauc plot according to the following equation: [59][60][61] (αhν) 2…”
Section: Raman Spectroscopymentioning
confidence: 99%
“…[13][14][15][16] Similarly, there have been few reports that the face-to-face annealing of Ga 2 O 3 thin films on sapphire substrates at 800 °C for 2 hours would improve the film smoothness and crystalline quality. 17,18 However, there are currently a lack of reports on the preparation of (Al x Ga 1−x ) 2 O 3 films through the face-to-face annealing method at high temperatures (>1000 °C). It is believed that annealing the Ga 2 O 3 films on a sapphire substrate in a face-to-face configuration can help suppress the thermal decomposition of Ga 2 O 3 at high temperatures while facilitating the infiltration of Al elements from both sides of the substrates into the Ga 2 O 3 film, which produces uniform high-Al composition (Al x Ga 1−x ) 2 O 3 films.…”
Section: Introductionmentioning
confidence: 99%
“…While not new to the scientific community, gallium oxide grasped the attention of many researchers in the past two decades. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15] The reason for much of the interest lies in this material's potential for offering solutions to challenges in niche markets. No perfect semiconductor exists for every application.…”
Section: Introductionmentioning
confidence: 99%