Improved tungsten nanofabrication for hard X-ray zone plates

Parfeniukas, Karolis; Rahomäki, Jussi; Giakoumidis, Stylianos; Seiboth, Frank; Wittwer, Felix; Schroer, Christian G.; Vogt, Ulrich

doi:10.1016/j.mee.2015.12.015

Cited by 13 publications

(8 citation statements)

References 12 publications

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“…The base angle of the structure indicated by arrow 2 is 90 • , the steep sidewall does not affect the reflection of light, so there is no dark stripe. When the base angle is 92 • , the top of the structure is wider than the bright region, as shown by arrow 3 . In Figure 5b, the structure indicated by the arrow is tilted.…”

Section: Simulated Resultsmentioning

confidence: 99%

“…High aspect ratio microstructures (HARMS) are widely used in many fields, such as optics [1][2][3] and MEMS (Microelectromechanical systems) [4][5][6][7][8]. UV-LIGA (Ultraviolet-Lithographie, Galvanoformung, Abformung) is considered as a powerful technique to fabricate HARMS with the linewidth of greater than 10 microns and the height of hundreds of microns [9][10][11][12].…”

Section: Introductionmentioning

confidence: 99%

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Optical Detection Method for High Aspect Ratio Microstructures

Wei

Hou

et al. 2020

Micromachines

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High aspect ratio microstructures (HARMS) are of great importance for many application fields. Many defects are generated during the fabrication processes, especially in line microstructures, and it is necessary to examine the quality of the structures after each process. However, there is no suitable efficient nondestructive detection method to monitor microstructures during the fabrication processes. In this paper, an optical detection method capable of detecting the structures by analyzing the reflection of light on the line HARMS is proposed. According to the image of reflected visible light, this method can determine whether there are defects in structures, so as to realize efficient detection. Preliminary simulations and experiments have been performed to confirm the feasibility and validity of the proposed method for detecting line microstructures. This method is expected to obtain more information about microstructures by further optimizing system parameters.

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Section: Simulated Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Optical Detection Method for High Aspect Ratio Microstructures

Wei

Hou

et al. 2020

Micromachines

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“…The core part of PtyNAMi is designed to accommodate different nanofocusing X-ray optics, such as NFLs (Schroer et al, 2003(Schroer et al, , 2004 for the harder X-ray regime above E = 10 keV and FZPs (Vila-Comamala et al, 2011;Gorelick et al, 2011;Parfeniukas et al, 2016;Mohacsi et al, 2016) for the lower X-ray spectrum below E = 10 keV. The setup is quite flexible, providing a general platform for the characterization of new X-ray optics (Seiboth et al, 2014;Lyubomirskiy et al, 2019).…”

Section: X-ray Optics and Nanobeam Characterizationmentioning

confidence: 99%

PtyNAMi: ptychographic nano-analytical microscope

et al. 2020

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Ptychographic X-ray imaging at the highest spatial resolution requires an optimal experimental environment, providing a high coherent flux, excellent mechanical stability and a low background in the measured data. This requires, for example, a stable performance of all optical components along the entire beam path, high temperature stability, a robust sample and optics tracking system, and a scatter-free environment. This contribution summarizes the efforts along these lines to transform the nanoprobe station on beamline P06 (PETRA III) into the ptychographic nano-analytical microscope (PtyNAMi).

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“…The mold is then filled with a metal by electrodeposition [7,8] or covered with a metal layer by atomic layer deposition [9,10]. The second method transfers the zone plate pattern into a metal layer by deep reactive ion etching [11,12]. However, in both cases, the achievable aspect ratios are limited to about 20:1.…”

Section: Introductionmentioning

confidence: 99%

Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates

et al. 2020

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Zone plates are diffractive optics commonly used in X-ray microscopes. Here, we present a wet-chemical approach for fabricating high aspect ratio Pd/Si zone plate optics aimed at the hard X-ray regime. A Si zone plate mold is fabricated via metal-assisted chemical etching (MACE) and further metalized with Pd via electroless deposition (ELD). MACE results in vertical Si zones with high aspect ratios. The observed MACE rate with our zone plate design is 700 nm/min. The ELD metallization yields a Pd density of 10.7 g/cm 3 , a value slightly lower than the theoretical density of 12 g/cm 3 . Fabricated zone plates have a grid design, 1:1 line-to-space-ratio, 30 nm outermost zone width, and an aspect ratio of 30:1. At 9 keV X-ray energy, the zone plate device shows a first order diffraction efficiency of 1.9%, measured at the MAX IV NanoMAX beamline. With this work, the possibility is opened to fabricate X-ray zone plates with low-cost etching and metallization methods.

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Improved tungsten nanofabrication for hard X-ray zone plates

Cited by 13 publications

References 12 publications

Optical Detection Method for High Aspect Ratio Microstructures

Optical Detection Method for High Aspect Ratio Microstructures

PtyNAMi: ptychographic nano-analytical microscope

Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates

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