2015
DOI: 10.1002/pssc.201400309
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Improvement of Cu2ZnSn(S,Se)4 solar cell efficiency by surface treatment

Abstract: Surface treatments for the purpose of contamination elimination and surface passivation were performed to as‐deposited CZTSSe thin films before CdS buffer layer deposition. It was found that HCl etching treatment removes contaminations such as sulfide and oxide on CZTSSe surface and helps enhancement of thiourea treatment carried out after HCl etching. Thiourea treatment drastically improves solar cell characteristics, especially FF and JSC, and it would have the effect of surface passivation, although surface… Show more

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Cited by 18 publications
(16 citation statements)
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“…The EQE responses of these solar cells with AS vapor treatment are all enhanced in the wavelength region of 500–1100 nm, which is made possible by the reduction of the surface defects of the absorber treated with AS vapor. The surface sulfurization passivates the absorber surface, thus leading to the improvement of CdS/CZTSSe interface properties . However, oxide compounds at the CZTSe surface prevent AS vapor from diffusing into the film.…”
Section: Resultsmentioning
confidence: 99%
“…The EQE responses of these solar cells with AS vapor treatment are all enhanced in the wavelength region of 500–1100 nm, which is made possible by the reduction of the surface defects of the absorber treated with AS vapor. The surface sulfurization passivates the absorber surface, thus leading to the improvement of CdS/CZTSSe interface properties . However, oxide compounds at the CZTSe surface prevent AS vapor from diffusing into the film.…”
Section: Resultsmentioning
confidence: 99%
“…[ 12 ] This critical process step was performed prior to the deposition of the CdS fi lm, by i) annealing the active layer in air (375 °C for 2 min) in order to oxidize the metal rich interfaces, and ii) applying a NH 4 OH-based wet etch (5 min dip in 7% aqueous NH 4 OH solution) to remove the newly created metal oxides (except SnO x ). In a similar way, a 30 min air annealing at wileyonlinelibrary.com 150 °C, followed by a wet aqueous chemical cleaning (thiourea and/or HCl dip), was found necessary for Furuta et al [ 23 ] to reach >10.5% effi cient devices (without ARC). This intentional oxidation appears quite similar to the one previously advocated by Repins et al which allowed them to achieve 9.15% with coevaporated CZTSe absorbers fabricated with a very Zn-rich terminated surface.…”
Section: Grain Boundaries Passivationmentioning
confidence: 93%
“…12. As suggested by Furuta et al the improvement of the characteristics seems to be due to improvement of the film quality and increase in the width of a depletion layer12. The latter assumption is demonstrated by the augmentation of the short-circuit current in the comparison between the same solar cells with and without HCl and thiourea treatment (Figs 2 and 3).…”
Section: Resultsmentioning
confidence: 60%
“…12. As suggested by Furuta et al the improvement of the characteristics seems to be due to improvement of the film quality and increase in the width of a depletion layer12.…”
Section: Resultsmentioning
confidence: 93%
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