1997
DOI: 10.1049/el:19970994
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Improvement of electroluminescence characteristicsof poroussilicon LED by using amorphous silicon layers

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Cited by 6 publications
(2 citation statements)
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“…Instead of light reflecting at grating surfaces, the light scatters at these surfaces for partial transmission of otherwise completely reflected light. A variety of methods exist to construct these gratings, including wet etching with an amorphous sacrificial layer [6][7][8][9] or laser etching to obtain a more periodic spacing [10][11][12][13][14]. Any of these methods can etch a transmission grating on a semiconductor surface, each with their respective advantages and disadvantages.…”
mentioning
confidence: 99%
“…Instead of light reflecting at grating surfaces, the light scatters at these surfaces for partial transmission of otherwise completely reflected light. A variety of methods exist to construct these gratings, including wet etching with an amorphous sacrificial layer [6][7][8][9] or laser etching to obtain a more periodic spacing [10][11][12][13][14]. Any of these methods can etch a transmission grating on a semiconductor surface, each with their respective advantages and disadvantages.…”
mentioning
confidence: 99%
“…To further mitigate the problems of total internal reflection, the emission surface can be patterned to form a transmission grating that offers the trapped light more angles of escape. This can be done with a variety of methods including wet etching with an amorphous sacrificial layer [6]- [9] or by laser etching to obtain a more periodic spacing [10]- [14]. In addition, it has been shown that the same patterning can also apply to a Ag reflector plate in either pillar or hole grating shapes to form a reflection grating [15], [16].…”
mentioning
confidence: 99%