“…8 In addition, in the case of the aliphatic photoresist, the patterned photoresist is easily deformed during the extended exposure to plasma due to the its softness, creating problems such as wiggling and notching. [11][12][13][14][15] Among the various hardmask materials, the ACL has been investigated widely due to its advantages such as a high etch selectivity over a photoresist, high optical transmittance, easy deposition, and removability by oxygen plasma, similar to that of a remaining photoresist, after etching. [11][12][13][14][15] Among the various hardmask materials, the ACL has been investigated widely due to its advantages such as a high etch selectivity over a photoresist, high optical transmittance, easy deposition, and removability by oxygen plasma, similar to that of a remaining photoresist, after etching.…”