Improvement of PMMA electron-beam lithography performance in metal liftoff through a poly-imide bi-layer system

Yaghmaie, Frank; Fleck, J.N.; Gusman, A. Jake; Prohaska, R.

doi:10.1016/j.mee.2010.07.030

Cited by 14 publications

(11 citation statements)

References 10 publications

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“…In this procedure, which is described in detail elsewhere, 21 the pattern emerges through selective removal of PMMA from the silicon wafer surface. Therefore, the bumps consist of PMMA and the flat surface between the bumps is silica.…”

Section: Resultsmentioning

confidence: 99%

Lipid Domain Pixelation Patterns Imposed by E-beam Fabricated Substrates

et al. 2012

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This work describes a technique for forming nanometer-scale pixilated lipid domains that are self-organized into geometric patterns residing on a square lattice. In this process, a lipid multibilayer stack is deposited onto a silica substrate patterned with a square lattice array of bumps, hemispherical on their sides, formed by electron beam lithography. Domain patterns are shown to be confined to the flat grid between the bumps and comprised of connected and individual domain pixels. Analysis of lattices of varying sizes shows that domain pattern formation is driven by mechanical energy minimization and packing constraints. We demonstrate single lattice sizes and a gradient in lattice size varying from the micrometer to the 100 nm scale applicable to precise arraying, patterning, and transport of biomolecules that partition to lipid domains.

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Section: Resultsmentioning

confidence: 99%

Lipid Domain Pixelation Patterns Imposed by E-beam Fabricated Substrates

et al. 2012

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“…Polymers are materials of special importance due to their extensive applications in diverse areas of physics, chemistry, materials science, and nanoscience. For example, PMMA has been widely used as a positive electron-beam resist in electronbeam lithography, 1,2 and it is important to know the spatial distribution of the energy deposited on it to improve the resolution of the patterns made by this procedure. Also this technique can be combined with ion implantation, Rutherford backscattering, and electronic microscopy to obtain nanostructures, 3 waveguides, 4 or modify the electrical properties of materials.…”

Section: Introductionmentioning

confidence: 99%

Inelastic scattering of electron and light ion beams in organic polymers

Vera

Abril

García-Molina

2011

Journal of Applied Physics

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We have calculated the inelastic mean free path, stopping power, and energy-loss straggling of swift electron, proton, and a-particle beams in a broad incident energy range in four organic polymers: poly(methyl methacrylate) (PMMA), Kapton, polyacetylene (PA), and poly(2-vinylpyridine) (P2VP). These calculations have been done through a suitable description of their optical properties and its extension into the whole momentum and energy transfer excitation spectrum. For electrons, we take into account the exchange effect between the projectile and the target electrons, while the charge-state fractions have been considered for ions. Our results are compared with other models and with the available experimental data. An excellent agreement with experimental data is obtained in the case of proton and a-particle beams in Kapton and a reasonably good agreement has been achieved for electron beams in PMMA, Kapton, and PA. We have parameterized by means of simple analytical expressions our results for electron beams interacting with these four polymers, which can be easily implemented in Monte Carlo calculations. V

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“…PMMA is a standard, often-used photoresist in SXCM because its particular optical properties provide high resolution. PMMA is also a suitable material for the cell culturing [26][27][28]. The photoresist development required the optimized content of the developer mixture (the optimal ratio of MIBK and isopropanol).…”

Section: Optimization Of Sxcm Technique For Cell Imagingmentioning

confidence: 99%

Imaging of Cell Structures Using Optimized Soft X-ray Contact Microscopy

et al. 2020

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This work is to study the relationship between the exposure conditions and the quality of cell imaging with soft X-ray contact microscopy (SXCM). It is a crucial step in the efficient visualization of cell structures. Three different human cell lines: DU145 prostate carcinoma cells, HCC38 breast cancer cells, and Poietics mesenchymal stem cells were used to establish the optimal exposure conditions in SXCM. The image quality depended on the soft X-ray (SXR) absorbed energy and photoresist development conditions. At lower SXR energy (200 or 400 SXR pulses), sharp cell edges, membrane projections, and cell–cell connections were visible. In contrast, higher energy (600 or 800 SXR pulses) allowed observation of the cytoskeleton and the nucleus in a cell type-dependent manner (the influence of cell thickness and internal complexity was noted).

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Improvement of PMMA electron-beam lithography performance in metal liftoff through a poly-imide bi-layer system

Cited by 14 publications

References 10 publications

Lipid Domain Pixelation Patterns Imposed by E-beam Fabricated Substrates

Lipid Domain Pixelation Patterns Imposed by E-beam Fabricated Substrates

Inelastic scattering of electron and light ion beams in organic polymers

Imaging of Cell Structures Using Optimized Soft X-ray Contact Microscopy

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