2020
DOI: 10.1149/2162-8777/aba4f2
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Improvement of Process Reproducibility and Particle Reduction for YF3 Coating by Collision Assisted Sintering Process in Reactive Ion Etching

Abstract: In reactive ion etching process, generation of particles and deterioration in process reproducibility due to high aspect ratio processing have become problems. In this study, YF 3 coating was investigated using collision assisted sintering process (CASP) technique to reduce particles and improve process reproducibility. It was clarified that the CASP had possibility of a high-density coating with fewer cracks and voids than atmospheric plasma spraying (APS) coating. The amount of etching and surface roughness … Show more

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