The Hall mobility of Ge thin films deposited on ZnS substrates at a substrate temperature of 600° C was 360 cm2/ V·s for a hole concentration of 3×1017 cm-3. This value was about 3.6 times larger than that obtained for Ge films deposited on Si3N4 substrates. A point-contact warm carrier device fabricated using Ge film deposited on ZnS substrate has a detected voltage for CO2 laser radiation about ten times higher than that of a device fabricated using Ge film deposited on Si3N4 substrate.