Recent Researches in Corrosion Evaluation and Protection 2012
DOI: 10.5772/34623
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Improvement of the Corrosion Resistance of Carbon Steel by Plasma Deposited Thin Films

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Cited by 4 publications
(3 citation statements)
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“…Similar results were obtained in a previous work 15 using a higher pressure (20 Pa) but with no oxygen addition in the gas mixture. The films deposited with the discharge power exceeding 50 W kept only a few hours adhered to the substrates.…”
Section: Thicknesssupporting
confidence: 80%
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“…Similar results were obtained in a previous work 15 using a higher pressure (20 Pa) but with no oxygen addition in the gas mixture. The films deposited with the discharge power exceeding 50 W kept only a few hours adhered to the substrates.…”
Section: Thicknesssupporting
confidence: 80%
“…Therefore, the etching rate of the films was considered null in all the cases. This result, also observed in a previous study 15 , is ascribed to the oxidation of the very first atomic layers of the films with intense loss of methyl groups, resulting in an oxide top layer. This one, very resistant to the atomic oxygen attack, protects the underneath organosilicon bulk from further ablation.…”
Section: Corrosion Resistancesupporting
confidence: 73%
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