2021
DOI: 10.1016/j.tsf.2021.138959
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Improvement of transparent conductive indium tin oxide based multilayer films on p-silicon through the inclusion of thin copper-aluminium metals interlayer

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Cited by 7 publications
(3 citation statements)
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“…The sensors can also detect humidity [29,30]. For these applications, the films were optimized by controlling various parameters such as the annealing temperature [31][32][33][34], substrate type [35][36][37][38], deposition method [39][40][41][42][43], and doping [44][45][46][47][48]. Regarding the deposition method, the ITO thin films were most frequently prepared using physical methods.…”
Section: Introductionmentioning
confidence: 99%
“…The sensors can also detect humidity [29,30]. For these applications, the films were optimized by controlling various parameters such as the annealing temperature [31][32][33][34], substrate type [35][36][37][38], deposition method [39][40][41][42][43], and doping [44][45][46][47][48]. Regarding the deposition method, the ITO thin films were most frequently prepared using physical methods.…”
Section: Introductionmentioning
confidence: 99%
“…The development of ITO thin films is of a great interest in the scientific community as a result of their interesting properties, which make them possible candidates for different applications, such as optoelectronic devices [ 1 , 2 , 3 ], transparent conductive oxides [ 4 ], solar cells [ 5 , 6 , 7 ], gas sensors [ 8 , 9 ], biosensors [ 10 , 11 , 12 ], thermoelectric applications [ 13 , 14 ], and so on. ITO thin films can be prepared by various physical (magnetron sputtering [ 15 , 16 , 17 , 18 , 19 ], pulsed lased deposition [ 20 ], ion beam sputtering [ 21 ], and electron beam evaporation [ 22 ]) and chemical methods (sol–gel method [ 23 , 24 ], spray pyrolysis [ 25 ], and low-temperature combustion synthesis method [ 26 ]).…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, ITO-coated glass substrates were used in liquid crystals display (LCD) [ 44 , 45 , 46 , 47 ] and polymer dispersed liquid crystals device fabrication [ 48 , 49 , 50 ]. The suitable material for a certain application can be achieved by changing several parameters involved in the preparation process as follows: the deposition technique [ 16 ], the metal doping level [ 51 ], the pre- and final annealing temperatures [ 19 ], and the film thickness [ 22 ].…”
Section: Introductionmentioning
confidence: 99%