1986
DOI: 10.1117/12.7973844
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Improvements In Avalanche-Transistor Sweep Circuitry For Electro-Optic Streak Cameras

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“…To date, these high-voltage nanosecond ramps have been generated using avalanche transistors [4]. Avalanche transistors are difficult to use [5] because they lack (reproducibility, reliability and stability) and are nonlinear so external pulse shaping is needed.…”
Section: Introductionmentioning
confidence: 99%
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“…To date, these high-voltage nanosecond ramps have been generated using avalanche transistors [4]. Avalanche transistors are difficult to use [5] because they lack (reproducibility, reliability and stability) and are nonlinear so external pulse shaping is needed.…”
Section: Introductionmentioning
confidence: 99%
“…Initially the electron beam is positioned off the screen, at the top, by the applied DC sweep plate voltages. After the sweep is completed, the electron beam is to be kept positioned off the screen at the bottom of the tube; this means that the ramps must be larger than 1.5 kV required for full deflection, To date, these high-voltage nanosecond ramps have been generated using avalanche transistors [4]. Avalanche transistors are ditlicult to use [5] because they lack (reproducibility, reliability and stability) and are nonlinear so external pulse shaping is needed.…”
mentioning
confidence: 99%