1983
DOI: 10.1063/1.93952
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Improvements on the electrical and luminescent properties of reactive molecular beam epitaxially grown GaN films by using AlN-coated sapphire substrates

Abstract: The electrical and luminescent properties of the GaN epitaxial films grown on AlN-coated sapphire by reactive molecular beam epitaxy have been studied. The GaN films on AlN epitaxial films have larger Hall mobilities and show more intense cathodoluminescence peaks at a wavelength of 360 nm than those of the GaN films grown directly on sapphire, which suggests that the crystal qualities of GaN films are improved by use of AlN-coated sapphire as substrates. The lattice matching and small difference of the therma… Show more

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Cited by 351 publications
(141 citation statements)
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“…Due to the lack of natural GaN substrates, GaN-based LED structures are made typically on the (0001) c-plane sapphire substrates. 3,4 The interfacial energy difference between sapphire and GaN could cause large amount of dislocations and low crystal quality of the subsequently grown GaN layer. 5 The degraded quality of GaN layers presents intensive nonradiative recombination centers severely reducing the efficiency.…”
mentioning
confidence: 99%
“…Due to the lack of natural GaN substrates, GaN-based LED structures are made typically on the (0001) c-plane sapphire substrates. 3,4 The interfacial energy difference between sapphire and GaN could cause large amount of dislocations and low crystal quality of the subsequently grown GaN layer. 5 The degraded quality of GaN layers presents intensive nonradiative recombination centers severely reducing the efficiency.…”
mentioning
confidence: 99%
“…1973 ±ÇÓÄÞÌ ÔËÐËÌ ÔÄÇÕÑAEËÑAE ®¥±-ÕËҠРÑÔÐÑÄÇ GaN, AEÑÒËÓÑÄÂÐÐÑÅÑ ÏÂÅÐËÇÏ [42] 1983 £ÞÔÑÍÑÍÂÚÇÔÕÄÇÐÐÞÌ GaN ÏÇÕÑAEÑÏ ®¿ Ô ËÔÒÑÎßÊÑÄÂÐËÇÏ ÃÖ×ÇÓ AlN [43] 1985 £ÞÔÑÍÑÍÂÚÇÔÕÄÇÐÐÞÌ GaN ÏÇÕÑAEÑÏ MOC-ÅËAEÓËAEÐÑÌ àÒËÕÂÍÔËË Ô ËÔÒÑÎßÊÑÄÂÐËÇÏ ÃÖ×ÇÓ AlN [6] 1989 GaN p-ÕËÒÂ Ô ËÔÒÑÎßÊÑÄÂÐËÇÏ°¯¿¿± (ÏÂÎÂâ ÍÑÐÙÇÐÕÓÂÙËâ AEÞÓÑÍ) [10] ±ÇÓÄÞÌ ÔÄÇÕÑAEËÑAE Ô ÑAEËÐÑÚÐÞÏ ÒÇÓÇØÑAEÑÏ Ä GaN 1991 ªÊÑÃÓÇÕÇÐËÇ AEÄÖØÒÑÕÑÍÑÄÑÌ MOC-ÅËAEÓËAEÐÑÌ àÒËÕÂÍÔËË [7] £ÞÓÂÜËÄÂÐËÇ GaN ÏÇÕÑAEÑÏ ®¿ Ô ËÔÒÑÎßÊÑÄÂÐËÇÏ ÃÖ×ÇÓ GaN [44] £ÞÔÑÍÑÍÂÚÇÔÕÄÇÐÐÞÌ GaN ÏÇÕÑAEÑÏ MOC-ÅËAEÓËAEÐÑÌ àÒËÕÂÍÔËË Ô ËÔÒÑÎßÊÑÄÂÐËÇÏ ÃÖ×ÇÓ GaN [9,45] ±ÇÓÄÞÇ ÐÇÒÓÇÓÞÄÐÞÇ ×ËÑÎÇÕÑÄÞÇ ÎÂÊÇÓÐÞÇ AEËÑAEÞ Ô ¥¤ Ë ®¬Á РÑÔÐÑÄÇ InGaN [29] ¬ÑÏÏÇÓÙËÂÎËÊÂÙËâ ÃÇÎÑÅÑ ÔÄÇÕÑAEËÑAEÂ Ô ËÔÒÑÎßÊÑÄÂÐËÇÏ ÔËÐÇÅÑ ÔÄÇÕÑAEËÑAEÂ Ô ¥¤ РÑÔÐÑÄÇ InGaN [27] . .…”
Section: ªôôîçAeñäâðëç Ganunclassified
“…The obtained tilt and the lateral mosaic dimensions are indicated in The hexagonal structured GaN shows high defect density when accumulated on different substrates like Al 2 O 3 , SiC and Si due to lattice inconsistency. These failures are dislocations and the main types of them [20,21] …”
Section: Xrd Analysismentioning
confidence: 99%