Metrology, Inspection, and Process Control for Microlithography XXXIV 2020
DOI: 10.1117/12.2552028
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Improving after-etch overlay performance using high-density in-device metrology in DRAM manufacturing

Ikhyun Jeong
1
,
Seung-Woo Koo
2
,
Hyun-Sok Kim
3
et al.
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