2023
DOI: 10.1109/jphot.2023.3250433
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Improving Light Extraction Efficiency of AlGaN-Based Deep Ultraviolet Light-Emitting Diodes by Combining Thinning p-AlGaN/p-GaN Layer With Ni/Au/Al High-Reflectivity Electrodes

Abstract: Improving light extraction efficiency (LEE) of AlGaN-based deep-ultraviolet (DUV) light emitting diodes (LEDs) has been attempted by thinning the p-AlGaN/p-GaN layer and adopting Ni/Au/Al composite electrodes. It is found that the thin p-AlGaN/p-GaN layer can reduce the light absorption and the Ni/Au/Al electrodes achieve high reflectivity and Ohmic contact to ensure the enhancement of the light extraction and maintain fine electrical properties. By this approach, the maximum external quantum efficiency of the… Show more

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Cited by 10 publications
(3 citation statements)
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“…[12,13] The lack of electrical conductivity in the top layer is especially relevant as highly conductive materials like indium tin oxide (ITO), aluminum-doped zinc oxide (AZO) or p-GaN, usually applied in blue InGaN/GaNbased LEDs cannot be used as current spreading layers in UV-C LEDs due to their strong UV-C absorption limiting light extraction in standard geometry. [14][15][16] This challenge is often being targeted by flip-chip mounting for emission through the UV-transparent sapphire substrate. [17,18] With a theoretical reflectivity of >90% in the UV-C regime, Al would be an ideal mirror material for the flip-chip geometry.…”
Section: Doi: 101002/adma202313037mentioning
confidence: 99%
“…[12,13] The lack of electrical conductivity in the top layer is especially relevant as highly conductive materials like indium tin oxide (ITO), aluminum-doped zinc oxide (AZO) or p-GaN, usually applied in blue InGaN/GaNbased LEDs cannot be used as current spreading layers in UV-C LEDs due to their strong UV-C absorption limiting light extraction in standard geometry. [14][15][16] This challenge is often being targeted by flip-chip mounting for emission through the UV-transparent sapphire substrate. [17,18] With a theoretical reflectivity of >90% in the UV-C regime, Al would be an ideal mirror material for the flip-chip geometry.…”
Section: Doi: 101002/adma202313037mentioning
confidence: 99%
“…In addition, conventional Ni/Au p-electrode exhibits high absorption of DUV light. Al, with a reflectivity of 92% at 250-280 nm, is widely used in sidewall reflectors and reflective electrodes for DUV FCLEDs [12,[14][15][16][17]. However, the Al sidewall reflector is often underutilized due to the limited sidewall area in DUV FCLEDs.…”
Section: Introductionmentioning
confidence: 99%
“…However, the luminous efficiency of AlGaN-based DUV-LEDs is still at a low level, which seriously affects the application effectiveness of AlGaN-based DUV LED [6], [7], [8], [9]. The main reasons for the low luminous efficiency of AlGaN-based DUV-LEDs are as follows: 1) High-quality AlGaN-based are difficult to prepare [10]; 2) p-AlGaN with high doping efficiency is difficult to realize [11]; 3) the drift rate of electrons is faster compared to that of holes, which results in the occurrence of electron leakage in the active region and the uneven distribution of carriers [12]; 4) the quantum confinement stark effect (QCSE) leads to the separation of the electron and hole wavefunctions in multiple quantum wells (MQWs), which reduces the chance of radiative recombination of carriers in MQWs [13]; 5) the light extraction efficiency (LEE) of AlGaN-based DUV-LEDs is still at a very low value [14].…”
mentioning
confidence: 99%