2000
DOI: 10.1016/s0921-4534(00)01382-4
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Improving on the yield and performance of high Tc rf SQUIDs

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Cited by 1 publication
(4 citation statements)
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“…The optimum ratio is lower than most reported values in the range of 0.5-1.0 [1]- [3], [5], [7], [8]. It is also significantly different from our rf SQUIDs of the same structure but fabricated using sputtered films for which is often 0.7.…”
Section: A Adjusting the Film Thicknesscontrasting
confidence: 86%
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“…The optimum ratio is lower than most reported values in the range of 0.5-1.0 [1]- [3], [5], [7], [8]. It is also significantly different from our rf SQUIDs of the same structure but fabricated using sputtered films for which is often 0.7.…”
Section: A Adjusting the Film Thicknesscontrasting
confidence: 86%
“…However, if employing conventional photolithographic process, it is very difficult to pattern the junction to width less than 1 m with precision. Reducing the film thickness and consequently the ratio of the film thickness to step height has been found to reduce the value effectively [7]. However, there is a lower limit on the film thickness before film discontinuity occurs over the step.…”
Section: Introductionmentioning
confidence: 99%
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