1994
DOI: 10.1063/1.112089
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Improving the mobility of an In0.52Al0.48As/In0.53Ga0.47As inverted modulation-doped structure by inserting a strained InAs quantum well

Abstract: The mobility of two-dimensional electrons in an In0.52Al0.48As/In0.53Ga0.47As inverted modulation-doped structure improved by inserting an InAs quantum well into the InGaAs channel. This letter addresses the main cause of this mobility improvement. By optimizing the thickness of the InAs quantum well, its distance from the underlying InAlAs spacer layer, and the InAlAs spacer-layer thickness, maximum mobilities of 16 500 cm2/V s at 300 K and 155 000 cm2/V s at 10 K are attained. The improvement in mobility is … Show more

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Cited by 54 publications
(21 citation statements)
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“…In this way, a 2DEG was confined in the inserted InAs layer. The doping density of the InAlAs carrier-supply layer was 4ϫ10 18 …”
Section: Ntt Basic Research Laboratories 3-1 Morinosato-wakamiya Atmentioning
confidence: 99%
“…In this way, a 2DEG was confined in the inserted InAs layer. The doping density of the InAlAs carrier-supply layer was 4ϫ10 18 …”
Section: Ntt Basic Research Laboratories 3-1 Morinosato-wakamiya Atmentioning
confidence: 99%
“…This phenomenology has been well established in a variety of superconductor-normal-metal-superconductor ͑SNS͒ junctions 3 and forms the basis of operation of the Josephson field-effect transistor. 4,5 A new class of weak links has now become available for research, 6 in which the superconductors are coupled by a monatomic layer of carbon ͑graphene͒. The low-lying excitations in this material are described by a relativistic wave equation, the Dirac equation.…”
mentioning
confidence: 99%
“…In Fig.6 we present µ as a function of Our results of mobility for different doping profiles show fascinating oscillatory behaviour. In fact, it is interesting to note that an inverted high electron mobility transistor (i-HEMT), in which the channel layer is located above the carrier-supply layer, has a superior electron confinement than that of the normal HEMT [22,23]. It has also been shown that the gate leakage current is strongly reduced in an i-HEMT compared to that of an n-HEMT structure.…”
Section: Resultsmentioning
confidence: 99%