2007
DOI: 10.1117/12.702589
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Improving the optical characteristics of bimetallic grayscale photomasks

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Cited by 3 publications
(1 citation statement)
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“…Current researches show that the grayscale photomask techniques based on different principle are inherent of very high resolution, and suitable to fabricate many kinds of microoptics structures such as microlens, waveguide, and other fine three-dimensional patterned grating and other functional devices, etc [1][2][3][4][5][6][7][8][9][10][11][12][13] . So far, the typical grayscale fabrication approaches include: the micro-mirror projection display, the high energy beam sensitive glass photomask, the halftone photomask, the modulated scanning laser beam or e-beam method, the ion exchange processing, etc.…”
Section: Introductionmentioning
confidence: 99%
“…Current researches show that the grayscale photomask techniques based on different principle are inherent of very high resolution, and suitable to fabricate many kinds of microoptics structures such as microlens, waveguide, and other fine three-dimensional patterned grating and other functional devices, etc [1][2][3][4][5][6][7][8][9][10][11][12][13] . So far, the typical grayscale fabrication approaches include: the micro-mirror projection display, the high energy beam sensitive glass photomask, the halftone photomask, the modulated scanning laser beam or e-beam method, the ion exchange processing, etc.…”
Section: Introductionmentioning
confidence: 99%