2018 International Symposium on Semiconductor Manufacturing (ISSM) 2018
DOI: 10.1109/issm.2018.8651152
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Improving thickness uniformity of sputter-deposited films by using magnet rotation speed control technique

Tatsuhiko Miura
1
,
Shota Takita
2
,
Makoto Usuki
3
et al.
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