Abstract:The aim of the work is to develop vacuum technological equipment for deposition an interference antireflection coating with the evaporation of a hydrophobic protective layer in a single vacuum cycle. To deposition an interference antireflection coating, the method of magnetron reactive sputtering in the alternating current mode with a frequency of 20 kHz is used. This method allows using of a wide range of sputtered materials and obtains stable and high-quality coatings on various substrates. To determine the … Show more
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