2012
DOI: 10.1016/j.jmmm.2012.05.012
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In-plane magnetic anisotropy and coercive field dependence upon thickness of CoFeB

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Cited by 49 publications
(13 citation statements)
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“…The strong UMA observed in the as-deposited films can be attributed to the stress during the growth. Similar trend was observed in CoFeB materials deposited on Si substrates, which was attributed to stress relief in the film at a specific thickness [25,26]. Again, it suggests the strong UMA observed in the as-deposited films mainly be induced by stress during the growth.…”
Section: Methodssupporting
confidence: 75%
“…The strong UMA observed in the as-deposited films can be attributed to the stress during the growth. Similar trend was observed in CoFeB materials deposited on Si substrates, which was attributed to stress relief in the film at a specific thickness [25,26]. Again, it suggests the strong UMA observed in the as-deposited films mainly be induced by stress during the growth.…”
Section: Methodssupporting
confidence: 75%
“…Therefore, this effect also points to a large amount of APBs. It has been reported [46][47][48] that the coercive field usually decreases with increasing film thickness. This effect has been attributed to the reduced defect density for thicker films.…”
Section: Discussionmentioning
confidence: 98%
“…Glancing incidence XRD (GIXRD) measurements (with an incident angle of 1°) of CFB films with different thickness was performed and the spectra are shown in Figure (1). The spectra show a common presence of a broad peak near 44.5°, which suggests the highly nanocrystalline (or amorphous) growth of CFB films [27] [28]. Fitting this hump using combination of a Gaussian and a Lorentzian function, the full width at half maxima is calculated, which is in the range of 8°-12°, yielding a crystallite size less than 1 nm.…”
Section: A X-ray Diffraction (Xrd) Studymentioning
confidence: 99%