2013
DOI: 10.1007/s11664-013-2486-2
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In Situ Characterization of Triboelectrochemical Effects on Topography of Patterned Copper Surfaces

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Cited by 5 publications
(2 citation statements)
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“…First of all, non-destructive methods were implemented in order to determine basic surface and bulk parameters, and precisely select a large sub-area of homogeneity (LSAH) with systematic pattern. These observations seem to be a good complement to other interdisciplinary studies in the field of triboelectrochemical effects, in which one tries to find correlation between surface topography and electrochemical processes on the surface [37], including electrical field under contacts effects [38]. The authors are convinced that the presented research gives an insight on better understanding the parasitic effects in micro-and nanoelectronics composed of A III B V semiconductor structures, for which p+ type InAs is often one of the sub-contact layers.…”
Section: Introductionmentioning
confidence: 69%
“…First of all, non-destructive methods were implemented in order to determine basic surface and bulk parameters, and precisely select a large sub-area of homogeneity (LSAH) with systematic pattern. These observations seem to be a good complement to other interdisciplinary studies in the field of triboelectrochemical effects, in which one tries to find correlation between surface topography and electrochemical processes on the surface [37], including electrical field under contacts effects [38]. The authors are convinced that the presented research gives an insight on better understanding the parasitic effects in micro-and nanoelectronics composed of A III B V semiconductor structures, for which p+ type InAs is often one of the sub-contact layers.…”
Section: Introductionmentioning
confidence: 69%
“…We have recently developed a novel approach using tribo-electrochemical principles to study material removal and degradation. 13,16 A setup containing a tribometer and a potentiostat was assembled for this purpose. The electrochemical impedance spectroscopy (EIS) was used as an analytical tool to evaluate the surface chemical conditions.…”
mentioning
confidence: 99%