10th IEEE International Conference of Advanced Thermal Processing of Semiconductors
DOI: 10.1109/rtp.2002.1039461
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In situ cleaning of LPCVD furnaces using a thermal NF/sub 3/ etch process

Eddy Timmermans
1
,
M. J. Teepen
2
,
F. Huussen
3
et al.
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