In-situ controlled growth of carbon nanotubes by local synthesis

Kawano, Takeshi; Cho, Chung Yeung; Lin, Liwei

doi:10.1109/memsys.2007.4433095

Cited by 3 publications

(1 citation statement)

References 7 publications

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“…A similar growth study on Cr NWs is also reported. 188 A similar technique utilising local heating and electric fields is also proposed for CNTs, 189 with the first demonstrations under electric fields carried out in 2001. 190,191 These early studies utilised parallel electrodes between which a DC field is applied.…”

Section: Growth Studiesmentioning

confidence: 99%

Integration of one-dimensional nanostructures with microsystems: an overview

Alaca

2009

International Materials Reviews

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The current state of solutions provided for the issue of integration between micro-and nanoscales is reviewed for the specific case of nanowires and nanotubes. Such structures serve as field emitters, transistors or laser sources, digits for manipulation and handling, as sensing elements or as agents for the modification of surface properties such as the adhesive strength. However, it is noteworthy that the majority of reported device work remains confined to component level prototype development without the prospect of full scale system integration due to the lack of batch compatible fabrication and processing techniques. On the one hand, nanostructures made by self-assembly do not possess a high level of control on their orientation and numbers, and hence, their interfacing and integration with a microsystem pose difficulties. On the other hand, top-down approaches such as manipulation, serial deposition and high resolution lithographic techniques do not satisfy the needs of large scale fabrication due to their expensive and/or nonparallel working principles. These techniques along with hybrid approaches taking advantage of the structural control of self-assembly and geometric control of high resolution lithography will be discussed and major applications will be highlighted to shed light on the capabilities and limitations associated with each process.

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