In situ differential atomic force microscopy (AFM) measurement for ultra-thin Thiol SAM patterns by area-selective deposition technique

Gao, Xinshuang; Zhang, Hongru; Li, Shi; Wang, Luya; Dai, Xingang; Hu, Yanjun; Xu, Junquan; Jing, Gaoshan; Fan, Guofang

doi:10.1016/j.surfin.2024.104133

Cited by 1 publication

(1 citation statement)

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“…Although simple, the previous methods are not always reliable since created edges are usually irregular and wide, the height levels of both film and substrate are not well defined, while the substrate can be even damaged during the scratching. Improved methods are based on the utilization of more sophisticated masks before the film deposition [24][25][26][27][28], the combination of appropriate masks and subsequent etching [29][30][31], or on the film transfer on another substrate [32].…”

Section: Introductionmentioning

confidence: 99%

Thickness measurement of thin films using atomic force microscopy based scratching

Vasić,

Aškrabić

2024

Surf. Topogr.: Metrol. Prop.

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Thin-film thickness measurements using atomic force microscopy (AFM) comprise two steps: 1. AFM scratching in order to produce an exposed film edge, and 2. subsequent AFM measurement of the corresponding step height across the exposed edge. Although the technique is known, many open questions have limited its wider applications. In order to clarify the open questions, here we first demonstrate how to determine the normal force applied during the scratching in contact mode needed to completely remove films from substrates. In order to determine film thickness from processed AFM images, we discuss two procedures based on the histogram method and polynomial step-function fitting. Mechanisms of the scratching process are elucidated by the analysis of lateral forces and their enhancement during the film peeling. Phase maps of scratched domains recorded in amplitude modulation AFM (tapping) mode display a clear contrast compared to pristine films. Therefore, we suggest their utilization as simple indicators of spatial domains with completely removed films. As an example, here the measurements were done on polymer films fabricated by layer-by-layer deposition of oppositely charged polyelectrolytes composed of poly(allylamine hydrochloride) and poly(sodium 4-styrenesulfonate), while the applicability of the presented method on other materials is discussed in detail.

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