In situ etch rate measurements of thin film combinatorial libraries

Perkins, John D.; Hest, Maikel F.A.M. van; Teplin, Charles W.; Dabney, Matthew S.; Ginley, David S.

doi:10.1016/j.apsusc.2007.05.094

Cited by 2 publications

(1 citation statement)

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“…Electronic addresses: mitrovic@caltech.edu and gregoire@caltech.edu optical interference pattern to measure film thickness and etch rate. 6 Fluorescence screening of combinatorial libraries, in particular, has reached high-throughput levels. 7,8 For solar energy applications, several studies have mapped optical properties of composition libraries to identify transparent conductive oxides, [9][10][11] with the most comprehensive technique described by Perkins et al using a combination of a FTIR spectrometer and a fiber optic instrument.…”

Section: Introductionmentioning

confidence: 99%

High-throughput on-the-fly scanning ultraviolet-visible dual-sphere spectrometer

Mitrović

Cornell

Marcin

et al. 2015

Review of Scientific Instruments

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A new simple and low cost scattered transmission accessory for commercial double beam ultraviolet-visible spectrophotometers Rev. Sci. Instrum. 68, 4288 (1997); 10.1063/1.1148344 This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitationnew. We have developed an on-the-fly scanning spectrometer operating in the UV-visible and near-infrared that can simultaneously perform transmission and total reflectance measurements at the rate better than 1 sample per second. High throughput optical characterization is important for screening functional materials for a variety of new applications. We demonstrate the utility of the instrument for screening new light absorber materials by measuring the spectral absorbance, which is subsequently used for deriving band gap information through Tauc plot analysis. C 2015 AIP Publishing LLC. [http://dx

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