In-situ FTIR Study of Atomic Layer Deposition (ALD) of Copper Metal Films

Dai, Min; Kwon, Jinhee; Langereis, E Erik; Wieluński, L.S.; Chabal, Yves J.; Li, Zhengwen; Gordon, Roy G.

doi:10.1149/1.2779073

Cited by 28 publications

(18 citation statements)

References 12 publications

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“…A study by Dai et al followed the reaction of copper amidinate precursor ([Cu( s Bu-amd)] 2 , Copper (I) di-sec-butylacetamidinate) with several surfaces including H-Si(100). 108 Despite lower reactivity compared to oxide surfaces, this reaction could be easily followed spectroscopically and it was concluded that the initial reaction happened very quickly, within a few seconds of exposure at a substrate temperature of 185 1C. The remaining surface species exhibited CH x stretching modes observed by infrared spectroscopy, confirming incomplete removal of the ligands.…”

Section: Chemical Reactivity and Selectivity Of The Modified Silicon ...mentioning

confidence: 96%

Reactivity of selectively terminated single crystal silicon surfaces

Perrine

Teplyakov

2010

Chem. Soc. Rev.

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As the cornerstone of multiple practical applications, silicon single crystal surfaces have attracted the interest of scientific and engineering communities for several decades. The most recent advances employ the surfaces precovered with a specific functionality to extend into the realm of organic and metal-organic films with well-defined interfaces, to protect the surfaces from oxidation and other contaminations, and to build the components of present and future molecular electronics and sensing devices. This critical review will focus on the reactivity of the selectively terminated Si(100) and Si(111) surfaces. The hydrogen and halogen-terminated surfaces are the most widely used and most heavily reviewed previously, thus only a brief summary will be given here with the emphasis of the most recent thermal approaches to functionalization of hydrogen-terminated silicon. The silicon surfaces precovered with NH(x) functionality are emerging as a very likely candidate both for the production of sharp interfaces and for coadsorption, co-assembly, and potential molecular templating of patterns on single crystalline surfaces. A brief overview of recent advances in achieving control over the hydroxyl-termination of silicon will be given. Some future directions for further development of chemistry, reactivity, and assembly on these surfaces, as well as potential applications, are highlighted in the last section (152 references).

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Section: Chemical Reactivity and Selectivity Of The Modified Silicon ...mentioning

confidence: 96%

Reactivity of selectively terminated single crystal silicon surfaces

Perrine

Teplyakov

2010

Chem. Soc. Rev.

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“…For instance, in the case of copper acetamidinates (Fig. 1), which can be used alternately with hydrogen to deposit Cu films of reasonably good quality, 19,20 our initial studies using temperature programmed desorption (TPD) and X-ray photoelectron spectroscopy (XPS) have suggested that alkyl substituents with b hydrogens may be prone to dehydrogenation reactions to produce olefins and surface acetamide moieties (Fig. 2).…”

Section: Deposition Of Metal Filmsmentioning

confidence: 99%

The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing

2008

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“…A promising family of metal precursors for ALD is that based on amidinates. Amidinates and related complexes (iminopyrrolidinates, guanidinates) have been long known to be stable, − and their introduction for chemical vapor deposition (CVD) and ALD uses has also been assessed in years past. ,− In particular, a number of Cu amidinates have been tested for the deposition of Cu-containing films, ,− and we − and others ,,, have looked in detail at their surface chemistry as well. For instance, temperature-programmed desorption (TPD) and X-ray photoelectron spectroscopy (XPS) experiments to characterize the thermal chemistry of copper(I)– N , N ′-di- sec -butylacetamidinate adsorbed on Ni(110) and Cu(110) single-crystal surfaces have shown a complex chemistry over a wide range of temperatures.…”

Section: Introductionmentioning

confidence: 99%

Density Functional Theory Study of the Surface Adsorption and Dissociation of Copper(I) Acetamidinates on Cu(110) Surfaces

2019

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Metal amidinates are common compounds with many applications, and are of particular value as precursors for the chemical deposition of thin metal films on solid surfaces. In order to better understand those processes, the surface chemistry of copper(I)−N,N′dimethylacetamidinate on Cu(110) single-crystal surfaces has been studied using first-principles quantum-mechanics calculations. Most metal amidinates exist as dimers (or tetramers) in the gas phase. Here, it was found that the initial steps of the adsorption and dissociation of those dimers on metal surfaces depend on their surface coverage. At low coverages, it was found that the copper(I)−N,N′-dimethylacetamidinate dimer initially binds to the Cu surface by occupying two bridge sites, with the four N atoms on top of adjacent surface Cu atoms. This configuration is, however, not stable, so the adsorbed dimer undergoes dissociation soon after via the shedding of one of the ligands; in this more stable configuration, both Cu atoms from the inorganic precursor occupy hollow sites, and one of the ligand remains coordinated on top of them whereas the other breaks away and binds directly to the surface via its N atoms. At high coverages, the dimer dissociates partially as well, but one of its ligands remains partially attached. It is speculated here, on the basis of the energetics of the different adsorbed species, that molecular desorption in this system may occur with the copper(I)−N,N′-dimethylacetamidinate as either a dimer or a monomer, a conclusion consistent with experimental observations. An analysis of the charge distributions in the adsorbed species shows a reduction of the Cu atoms of the dimer until reaching a metallic state once the ligands are all removed.

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In-situ FTIR Study of Atomic Layer Deposition (ALD) of Copper Metal Films

Cited by 28 publications

References 12 publications

Reactivity of selectively terminated single crystal silicon surfaces

Reactivity of selectively terminated single crystal silicon surfaces

The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing

Density Functional Theory Study of the Surface Adsorption and Dissociation of Copper(I) Acetamidinates on Cu(110) Surfaces

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