In-situ interferometric monitoring of optical coatings

Here we introduce an in situ and non-intrusive surface and thickness profile monitoring scheme of thin-film growth during deposition. The scheme is implemented using a programmable grating array based zonal wavefront sensor integrated with a thin-film deposition unit. It provides both 2D surface and thickness profiles of any reflecting thin film during deposition without requiring the properties of the thin-film material. The proposed scheme comprises a mechanism to nullify the effect of vibrations which is normally built in with the vacuum pumps of thin-film deposition systems and is largely immune to the fluctuations in the probe beam intensity. The final thickness profile obtained is compared with independent off-line measurement and the two results are observed to be in agreement.

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Optimization of Electron-Beam Evaporation Process Parameters for ZrN Thin Films by Plasma Treatment and Taguchi Method

Tien

Chiang

Lin

2023

Plasma

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This study presents the optimal process parameters of zirconium nitride (ZrN) thin films prepared by ion-assisted deposition (IAD) technology combined with electron-beam evaporation based on plasma surface treatment and the Taguchi method. We use Minitab statistical software (Version 20.2.0) and L9 orthogonal array parameter design combined with the response surface method (RSM). The quadratic polynomial regression equation was optimized by the RSM. Based on the control factor screening test of the Taguchi method, we determined the most critical factor combination for the process and derived the optimized process parameters of the ZrN thin films. In the coating experiments, we successfully achieved the optimal combination of good refractive index, adequate residual stress, and lower surface roughness on B270 glass substrates. These results indicate that the optimized preparation process can simultaneously achieve several desirable properties, improving the performance and application of ZrN thin films. Furthermore, our research method not only reduces the number of experiments and costs but also improves the efficiency of research and development. By screening key factors and optimizing process parameters, we can find the best process parameter more rapidly, reduce the demand for expenses given materials and equipment costs, and contribute to improving the electron-beam evaporation process. According to the experimental results, it can be observed that under certain conditions, the properties of ZrN thin films reached optimal values. These results are highly useful for optimizing the process parameters of ZrN thin films and provide a basis for further improvement of the thin film properties.

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In-situ interferometric monitoring of optical coatings

Cited by 4 publications

References 15 publications

Dynamic Interferometer Based on Fiber-Bragg-Grating Laser Diode

Dynamic Interferometer Based on Fiber-Bragg-Grating Laser Diode

Experimental demonstration of in situ surface and thickness profile measurements of thin film during deposition using a grating array based wavefront sensor

Optimization of Electron-Beam Evaporation Process Parameters for ZrN Thin Films by Plasma Treatment and Taguchi Method

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