2007
DOI: 10.1002/cvde.200606584
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In Situ Monitoring of Silicon Plasma Etching Using a Quantum Cascade Laser Arrangement

Abstract: In etch plasmas used for semiconductor processing, concentrations of the precursor gas NF 3 and of the etch product SiF 4 are measured online and in situ using a new diagnostic arrangement, the Q-MACS Etch system, which is based on quantum cascade laser absorption spectroscopy (QCLAS). In addition, the etch rates of SiO 2 layers and of the silicon wafer are monitored including plasma-etching endpoint detection. For this purpose the Q-MACS Etch system is working as an interferometer arrangement. The experiments… Show more

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Cited by 44 publications
(46 citation statements)
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“…Furthermore it has already been successfully applied to the study of plasma processes, e.g. of microwave and RF discharges [53,54]. Of special interest for all hydrocarbon-based processes is the capacity to detect transient molecules like the CH 3 radical, as the supposed key growth species, by means of QCLAS (figure 12).…”
Section: Plasma Diagnostics With High Time Resolutionmentioning
confidence: 99%
“…Furthermore it has already been successfully applied to the study of plasma processes, e.g. of microwave and RF discharges [53,54]. Of special interest for all hydrocarbon-based processes is the capacity to detect transient molecules like the CH 3 radical, as the supposed key growth species, by means of QCLAS (figure 12).…”
Section: Plasma Diagnostics With High Time Resolutionmentioning
confidence: 99%
“…QCLAS in the gas phase is now applied in various fields covering environmental trace gas detection [1][2][3], detection of toxic species or explosives [4,5], isotope ratio measurements [6], breath gas analysis [7,8] as well as industrial process monitoring [9] and plasma diagnostics [10][11][12]. The first demonstration of a QCL in 1994 [13], based on the idea of Kazarinov and Suris [14], and further development enable now pulsed or continuous wave, thermoelectrically (TE) cooled, single-mode distributed feedback (DFB-)QCLs to be used in spectrometers.…”
Section: Introductionmentioning
confidence: 99%
“…However, at low pressure conditions the measured absorption features are affected by an obstacle known as the "rapid passage effect" accompanied by potential power saturation effects [16,17]. Nevertheless, if a sensible normalisation [12] or calibration [9,11] is performed quantitative results can be obtained. This also addresses the required high resolution spectra of molecules with a complex structure which are typically absent or difficult to measure in jet cooled experiments.…”
Section: Introductionmentioning
confidence: 99%
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“…Extensions originally developed for TDLAS, e.g., the sweep integration method [7,8], were adapted to pulsed QCL spectrometers [9] and enable a time-resolution of milliseconds. Employing this method is not only of interest for on-line trace gas measurements, on which most of the experiments carried out so far were focussing [5,6,[9][10][11][12][13][14][15][16][17], but also for monitoring species in plasma diagnostics [18][19][20]. Later, the inherent frequency-down chirp of the lasers was exploited by using long pulses to acquire absorption spectra during the pulse [21,22].…”
mentioning
confidence: 99%