2015
DOI: 10.1016/j.proeng.2015.01.126
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In Situ Raman Monitoring of the Formation and Growth of Carbon Nanotubes via Chemical Vapor Deposition

Abstract: An in situ measurement technique based on Raman spectroscopy is established to simultaneously monitor the parameters of interest of the solid and gas phases during the formation and growth of carbon nanotubes (CNT) in a cold wall reactor for catalytic chemical vapor deposition (CCVD). Iron nanoparticles were used as a catalyst and acetylene as a carbon source. This new developed technique makes possible the simultaneous in situ measurement of the gas phase composition, the gas phase temperature and the micro s… Show more

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Cited by 8 publications
(4 citation statements)
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“…(after the 3h process) to 11.2 cm -1 (13h), confirming a better quality of the diamond particles produced for longer etching/growth time (the smaller Δν value indicates a higher crystalline quality and purity [29,30]). The growth process of the diamond particles prepared by hydrogen plasma etching graphite as the carbon source is schematically shown in Figure 5.…”
Section: Resultsmentioning
confidence: 67%
“…(after the 3h process) to 11.2 cm -1 (13h), confirming a better quality of the diamond particles produced for longer etching/growth time (the smaller Δν value indicates a higher crystalline quality and purity [29,30]). The growth process of the diamond particles prepared by hydrogen plasma etching graphite as the carbon source is schematically shown in Figure 5.…”
Section: Resultsmentioning
confidence: 67%
“…The N-CNT samples shows relatively great I D /I G ratio (1.4), compared to the non-doped counterparts (SWCNT, MWCNT). I D /I G ration of nitrogen free, multiwall carbon nanotubes from acetylene were 1.05, [27] In the case of highly oriented pyrolytic graphite, the D band not visible on the Raman spectra, the I D /I G of the high graphitized single wall carbon nanotube was obtained 0.09 [28,29].…”
Section: Catalytic Activity Of Supported Pd Catalyst In Ethane Decompmentioning
confidence: 97%
“…In general, the use of CVD processes in fabrication of superhydrophobic surfaces have served the two purposes: to create unique surface roughness and/or to deposit a low surface energy hydrophobic monolayer. [51][52][53][54][55][56][57][58][59][60][61][62][63] Crick et al [64] employed an aerosolassisted CVD (AACVD) technique to fabricate a superhydrophobic and photocatalytic surface. PDMS and functionalized titania nanoparticles were mixed in a chloroform solvent to fabricate films with surface projections of around 3-5 μm.…”
Section: Chemical Vapor Depositionmentioning
confidence: 99%