2012
DOI: 10.1016/j.optlaseng.2012.07.017
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In-situ SEM investigation of sub-microscale deformation fields around a crack-tip in silicon

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Cited by 13 publications
(4 citation statements)
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“…Finally, the use of the grid method at the microscopic scale is reported in various papers, see for instance Refs. , for measuring strain near a dislocation , for observing singularities like disclinations in nanoparticles , for measuring residual stresses and for measuring deformation near a crack tip. Strain fields were also measured in many other situations, for instance, around low‐angle grain boundaries , in silicon transistors , in nanowires or in MEMS devices .…”
Section: Examplesmentioning
confidence: 99%
“…Finally, the use of the grid method at the microscopic scale is reported in various papers, see for instance Refs. , for measuring strain near a dislocation , for observing singularities like disclinations in nanoparticles , for measuring residual stresses and for measuring deformation near a crack tip. Strain fields were also measured in many other situations, for instance, around low‐angle grain boundaries , in silicon transistors , in nanowires or in MEMS devices .…”
Section: Examplesmentioning
confidence: 99%
“…Therefore, the measured area by GPA is limited within a nanometer scope, which confined its application for a large area measurement. In fact, combining with advanced grating fabrication techniques, GPA can also be used to measure the deformation at the macro-and microscales [28][29][30]. For large area measurements using the GPA method, the mean relative error of the strain is approximately 1.5% [31].…”
Section: Introductionmentioning
confidence: 99%
“…Recently, combining with the advanced fabrication techniques of high-frequency gratings [8][9][10], GPA has been widely used in the deformation measurement at micro-and nano-scale [11][12][13][14][15][16][17]. The traditional GPA method, referred to as FT-GPA in this paper, is based on the relationship between the displacement and the phase difference.…”
Section: Introductionmentioning
confidence: 99%