In situ stress measurements and mechanical properties of a composition range of NiTi thin films deposited at elevated temperature

Kotnur, V.G.; Janssen, G. C. A. M.

doi:10.1016/j.surfcoat.2011.10.047

Cited by 15 publications

(3 citation statements)

References 14 publications

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“…2(c), there is a delamination, indicating the brittleness of the materials and the influence of wafer curvature on film deposition which yields the thermal stress. [22] Thin film adhesion properties with respect to sputtering conditions are not always evident, although it has a great practical importance. In the case of 500°C annealing (as shown in Fig.…”

Section: Resultsmentioning

confidence: 99%

Characterisation and properties of magnetron sputtered nanoscale bi‐layered Ni/Ti thin films and effect of annealing

Behera

Aich

2015

Surface & Interface Analysis

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Single-bi-layer of Ni-Ti thin film was deposited using DC and RF magnetron sputtering technique by layer-wise deposition of Ni and Ti on Si(100) substrate in the order of Ni as the bottom layer and Ti as the top layer. The deposition of these amorphous as-deposited thin films was followed by annealing at 300°C, 400°C, 500°C, and 600°C temperature with 1-h annealing time for each to achieve crystalline thin films. This paper describes the fabrication processes and the novel characterization techniques of the as-deposited as well as the annealed thin films. Microstructures were analysed using FESEM and HRTEM. Nanoindentation and AFM were carried out to characterize the mechanical properties and surface profiles of the films. It was found that, for the annealing temperatures of 300°C to 600°C, the increase in annealing temperature resulted in gradual increase in atomiccluster coarsening with improved ad-atom mobility. Phase analyses, performed by GIXRD, showed the development of silicide phases and intermetallic compounds. Cross-sectional micrographs exhibited the inter-diffusion between the two-layer constituents, especially at higher temperatures, which resulted either in amorphization or in crystallization after annealing at temperatures above 400°C.

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Section: Resultsmentioning

confidence: 99%

Characterisation and properties of magnetron sputtered nanoscale bi‐layered Ni/Ti thin films and effect of annealing

Behera

Aich

2015

Surface & Interface Analysis

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“…The coatings exhibited a clear tendency toward strain recovery upon heating (about 0.4% of recovered strain). A changing stress-strain response during the three subsequent cycles suggested that a plastic deformation is also involved, and the reached maximum stresses are rather limited for NiTi [28][29][30][31][32]. This result would suggest that there is still a niche for further improvement of the NiTi coatings properties by further optimization of the RF-ICP spray conditions and parameters, including their microstructure and chemical and phase homogeneity and, consequently, their thermomechanical behavior.…”

Section: Functional Properties Of Plasma Sprayed Niti Coatingsmentioning

confidence: 99%

Fabrication of Thermal Plasma Sprayed NiTi Coatings Possessing Functional Properties

et al. 2021

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Thick NiTi shape memory alloy coatings (300–500 µm) were produced on graphite and AISI 304 substrates by radio frequency inductively-coupled plasma spray technology (RF-ICP) from feedstock NiTi powders. Their microstructure as well as chemical and phase composition were characterized and a methodology for the characterization of functional shape memory properties of the thick coatings was developed. The coatings exhibited cubic to monoclinic martensitic transformation and shape memory effect. The presented results prove that NiTi coatings with functional thermomechanical properties can be easily produced on structural materials by RF-ICP. Further optimization will be needed to prepare NiTi coatings with better microstructural and chemical homogeneity.

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“…Usually, the SMA will be deposited as a thin film on rigid substrate and peeled off after deposition to enable the development of devices [25][26][27][28][29] . Subsequently, shape training of the SMA thin film is required before deployment.…”

Section: Introductionmentioning

confidence: 99%

Thermo mechanical and Control Behaviour of Copper based Shape Memory Alloy Bimorph Actuator towards the Development of Micro Positioning System

Muralidharan

Jayachandran

Yogeshwaran³

et al. 2020

Def. Sc. J.

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A shape memory alloy (SMA) bimorph actuator is a composite structure composed of flexible polyimide substrate and SMA thin film deposited using thermal evaporation technique. In this work, the substrate thickness in the range of 25 - 75 mm was selected for the development of CuAlNiMn SMA bimorph actuator. An investigation on the control behavior of copper based SMA bimorph towards the development of micro positioning system has been performed. The actuation behavior of the SMA bimorph was studied using electrical actuation. Subsequently, a proportional integral derivative (PID) controller was designed to control the bimorph actuator with proper tuning of gain parameters. The displacement of the bimorph actuator was controlled through dedicated experimental setup consisted of laser displacement sensor, data acquisition system and LabVIEW software. The CuAlNiMn SMA bimorph actuator resulted in a satisfying control performance which can be extended to MEMS applications. A preliminary prototype of the SMA bimorph actuator based micro positioning system has been developed.

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In situ stress measurements and mechanical properties of a composition range of NiTi thin films deposited at elevated temperature

Cited by 15 publications

References 14 publications

Characterisation and properties of magnetron sputtered nanoscale bi‐layered Ni/Ti thin films and effect of annealing

Characterisation and properties of magnetron sputtered nanoscale bi‐layered Ni/Ti thin films and effect of annealing

Fabrication of Thermal Plasma Sprayed NiTi Coatings Possessing Functional Properties

Thermo mechanical and Control Behaviour of Copper based Shape Memory Alloy Bimorph Actuator towards the Development of Micro Positioning System

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