In-situ study on alternating vapor deposition polymerization of alkyl polyamide with normal molecular orientation

Oligomer Orientation in Vapor-Molecular-Layer-Deposited Alkyl-Aromatic Polyamide Films

“…These two reactants can react with one another without a catalyst at room temperature with the generation of HCl vapor. 2,4,30 After the BDA half cycle, the surface becomes amine-terminated. 2−5 The amine groups then react during the TDC half cycle to form an amide bond and a carboxylic chloride terminus.…”

Organic–Inorganic Thin Films from TiCl4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?

“…[2] Many of the applications of hybrid materials, both the current applications and the potential new ones, require the material to be in thin-film form. [5][6][7][8][9][10][11][12][13][14] Although the history of ALD goes back to the 1960s [15] and 1970s, [16] and even though MLD was introduced already in the 1990s, [17][18][19][20][21] the two techniques were only re- cently combined to synthesize organic-inorganic hybrids. [3,4] The sequential manner of deposition sition of (Ti-O-C 6 H 4 -N=) n thin films from precursors TiCl 4 and 4-aminophenol (AP) with the essentially ideal growth rate of 10-11 Å per ALD/MLD cycle.…”

Preparation of Polyimide-Polyamide Random Copolymer Thin Film by Sequential Vapor Deposition Polymerization

“…6) Although many polymers, such as polyimide, 6) polyamide, 7) poly(amide-imide), 8) and polyurea 9) can be made using the VDP technique, it is difficult to synthesize the random copolymers because of the difficulty of evaporation of a variety of precursor monomers and the difference in the reactive sticking probabilities of precursor monomers on a substrate.…”