2006
DOI: 10.1143/jjap.45.8010
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InAs/GaAs Quantum-Dot Laser Diode Lasing at 1.3 µm With Triple-Stacked-Layer Dots-in-a-Well Structure Grown by Atomic Layer Epitaxy

Abstract: We report the first demonstration of room-temperature (RT) lasing at 1.3 µm from the ground state of three-stacked InAs quantum dots (QDs) in an In0.15Ga0.85As quantum well, which was grown by atomic layer epitaxy (ALE). For an as-cleaved device with a 2000-µm-long × 15-µm-wide ridge structure, the threshold current density (J th) at RT is 155 A/cm2 with the ground state lasing at 1310 nm under pulsed operation. The thermal coefficient of a lasing wavelength shift is 0.53 nm/K and the charact… Show more

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Cited by 12 publications
(4 citation statements)
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References 18 publications
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“…1). A clear blue shift is observed in sample Sb 18 , with a linear dependence on the third root of the excitation power, as expected for a type II system where the photo-excited carriers are spatially separated by the band bending. 12 In contrast, the peak energy of samples Sb 0 and Sb 8 is independent of the excitation power.…”
supporting
confidence: 77%
See 1 more Smart Citation
“…1). A clear blue shift is observed in sample Sb 18 , with a linear dependence on the third root of the excitation power, as expected for a type II system where the photo-excited carriers are spatially separated by the band bending. 12 In contrast, the peak energy of samples Sb 0 and Sb 8 is independent of the excitation power.…”
supporting
confidence: 77%
“…Note that the J th values obtained for our reference GaAs-capped InAs QDs are not as low as some previously reported. 18,19 This is probably due to problems with calibration of Al during the growth of the cladding layers, resulting in an unoptimized structure. Nevertheless, since the three samples were grown under the same conditions, this does not affect the comparative purpose of this work.…”
mentioning
confidence: 99%
“…On the other hand, there is a reduction by a factor of two in ℎ in both type-I and type-II Sb-containing QD LDs with respect to the reference Sb-free QD LD. Note that the ℎ values obtained for our reference GaAs-capped InAs QDs are not as low as some previously reported [205,206]. This is probably due to problems with calibration of Al during the growth of the cladding layers, resulting in an unoptimized structure.…”
Section: Threshold Current and Efficiencycontrasting
confidence: 53%
“…A remarkable optical characteristic of the 0D nanostructure has made them ideal for IR detection [ 2 ] and potential semiconductor lasers. [ 3 ] InAs/GaAs QD lasers are a stirring source for telecommunication applications [ 4 ] and long‐wavelength emission. [ 5,6 ] A careful investigation of the QD laser structure is crucial for revealing the characteristic device parameters, a different mode of operation, [ 7,8 ] and time‐ and temperature‐resolved optical performance.…”
Section: Introductionmentioning
confidence: 99%