It is demonstrated that the emission of InAs quantum dots ͑QDs͒ capped with GaAsSb can be extended from 1.28 to 1.6 m by increasing the Sb composition of the capping layer from 14% to 26%. Photoluminescence excitation spectroscopy is applied to investigate the nature of this large redshift. The dominant mechanism is shown to be the formation of a type-II transition between an electron state in the InAs QDs and a hole state in the GaAsSb capping layer. The prospects for using these structures to fabricate 1.55 m injection lasers are discussed. © 2006 American Institute of Physics. ͓DOI: 10.1063/1.2173188͔ Self-assembled InAs/ GaAs quantum dots ͑QDs͒ are of considerable interest due to their physical properties and potential applications, for example, long wavelength GaAsbased QD lasers operating in the 1.3-1.6 m telecommunications wavelength range. 1 High-performance InAs/ GaAs QD lasers, with emission close to 1.3 m, have been demonstrated using InGaAs, InAl͑Ga͒As, and GaAsSb capping layers ͑CLs͒ to directly cover the InAs QDs. [2][3][4][5][6] In addition, there have been a number of attempts to extend the emission wavelength beyond 1.5 m, with room-temperature ͑RT͒ photoluminescence ͑PL͒ above 1.5 m having been demonstrated for large InAs/ GaAs QDs, 7 GaInNAs/ GaAs QDs, 8 InAs QDs with an In 0.45 Ga 0.55 As CL, 9 InAs QDs with InGaNAs CL, 10 and InAs QDs grown on InGaAs or GaAsSb metamorphic buffer layers. 11,12 In a previous letter, we reported ϳ1.3 m emission from InAs QDs with a GaAsSb CL. 6 Evidence for a type-II system for Sb compositions Ͼ14% was obtained, and a 1.3 m laser was fabricated. In the present letter we show that RT emission at 1.6 m may be obtained by increasing the Sb composition to 26%. The compositional dependence of the electronic band structure is probed using a combination of PL and PL excitation ͑PLE͒.The samples were grown in a V80H molecular beam epitaxy system equipped with conventional solid sources for group-III elements and EPI cracker sources for As and Sb. The QDs were formed by depositing 2.8 monolayers ͑MLs͒ of InAs at a rate of ϳ0