From the perspective of materials and devices, the stability of OFETs can be improved by exploring highly stable materials, [16][17][18][19][20] or introducing encapsulation layers. [21][22][23] From a circuit design point of view, strategies like providing designing redundancy and optimizing circuit layouts are also used. For providing redundancy, Sugiyama et al. minimized the OFET performance variation by fabricating multiple OFETs separately, characterizing them one by one, handpicking the devices needed, and finally connecting them into the circuit. [4] And for layout optimization, Zhang et al. compared several layout techniques and pointed out that a common centroid layout can improve device uniformity at the cost of larger area overhead. [15] These strategies can effectively mitigate process variation; however, once the circuit is fabricated, they are incapable to fight against subsequent performance degradation caused by the environment. Therefore, it is necessary to incorporate postfabrication tunability in circuit design. For inverters and NAND gates, there has been a practical circuit design, namely pseudo-CMOS, [24,25] enabling postfabrication adjustability compensating the above-mentioned variation and instability, while for another important logical operation, namely XOR gates, such kind of design specifically for the OFET-suffered problems have rarely been reported. [26][27][28] To build an OFET-based XOR gate, in addition to the abovementioned key challenges that are to be tackled, another point that needs attention is that the already existing OFET-based XOR gates prefer to adopt the configuration that combines multiple NAND and/or NOR gates. [29][30][31] Although constructing other kinds of logic gates by stacking NAND gates is versatile, the lack of well-designed circuits will not only increase the cost of the number of transistors, but increase signal delay and reduce circuit performance as well. There are indeed ready-made designs in silicon-based electronics that OFETs can use, which are mainly based on pass transistor logic. [32][33][34][35] However, these designs usually require complementary transistors, resulting in less stable performance and more complex fabrication processes owing to the utilization of n-type organic semiconductors. These undesirable issues make p-type-only circuits more attractive and it is welcomed to find a unipolar circuit design for OFET-based XOR gates. [36] To address these challenges, we adopted a unipolar-transistorbased XOR gate design and excavated its postfabrication tunability, which is very important for solving the device instability Organic field-effect transistor (OFET)-based circuits require stable device performance. However, OFETs are suffering from process variation and environmental instability, which limits circuit performance. Here, an optimally designed XOR gate based on p-type-only OFETs is reported. The circuit has excellent postfabrication tunability that is enough to cope with a threshold voltage shift as high as 1.5 V. Moreover, the circui...