2005
DOI: 10.1002/adma.200501065
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Incorporation of Point Defects into Self‐Assembled Three‐Dimensional Colloidal Crystals

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Cited by 48 publications
(29 citation statements)
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“…[110] Nanoimprint lithography was used to introduce a plane of point defects between two colloidal multilayers. [111] Alignment of defects with the CC lattice was not possible and multiple additional processing steps were required to embed the layer of defects; however, since nanoimprint lithography is a parallel, less time-consuming process than e-beam lithography, it may still find application. It will be interesting to compare the optical properties of a 2D embedded layer of extrinsic point defects with those from randomly three-dimensionally distributed intrinsic point defects introduced via substitutional doping (see previous section).…”
Section: D Embedded Defects Via Multistep Proceduresmentioning
confidence: 99%
See 1 more Smart Citation
“…[110] Nanoimprint lithography was used to introduce a plane of point defects between two colloidal multilayers. [111] Alignment of defects with the CC lattice was not possible and multiple additional processing steps were required to embed the layer of defects; however, since nanoimprint lithography is a parallel, less time-consuming process than e-beam lithography, it may still find application. It will be interesting to compare the optical properties of a 2D embedded layer of extrinsic point defects with those from randomly three-dimensionally distributed intrinsic point defects introduced via substitutional doping (see previous section).…”
Section: D Embedded Defects Via Multistep Proceduresmentioning
confidence: 99%
“…[111][112][113][114] A similar approach to define embedded linear extrinsic defects is to use conventional photolithography to pattern a photoresist deposited on a CC (Fig. 12).…”
Section: D Embedded Defects Via Multistep Proceduresmentioning
confidence: 99%
“…[86] For point and line defects, however, optical characterization data are scarce. [63][64][65]69,[93][94][95][96][97] It seems that structural perfection needs to be improved further to fulfill the technological requirements. The presence of unwanted intrinsic defects such as cracks, vacancies, dislocations, and grain boundaries in colloidal crystals degrades the optical quality of a colloidal crystal template, thus largely eliminating the PBG behavior of the resultant 3D PhC.…”
Section: Discussionmentioning
confidence: 99%
“…[97] The fabrication method includes the self assembly of colloidal spheres, nanoimprint lithography, template-directed self assembly, and sequential growth of colloidal crystals (Fig. 14a).…”
Section: Point-defect Engineeringmentioning
confidence: 99%
“…Introduction of designed defect structures by low-cost and large-scale bottom-up self-assembly in 3D photonic crystals is only a recent development. The generation of advanced defects in CPCs is a complex matter, but great progress has been gained in the development of novel processes for the incorporation of point, [11,12] linear, [13][14][15][16][17] planar, [18][19][20][21][22] and 3D defects [23][24][25][26][27][28] during the last five years. Thus, large scale organization of monodisperse colloids can be combined with controlled defect generation.…”
Section: Introductionmentioning
confidence: 99%