“…To increase the LEE of LEDs, several approaches had focused on fabricating micro-/nanostructures either inside or outside the LEDs [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20]. For example, roughed GaN surface [3][4][5][6][7], roughed sapphire substrate [8,9], roughed indium tin oxide (ITO) surface [10][11][12], and grown ZnO micro-/nanostructures [13][14][15] have been implemented in LEDs. The common nanoscale patterning techniques, such as electron-beam lithography [16], nanoimprint lithography [17], holographic lithography [18], hydrothermally method [19], and nanosphere lithography (NSL) [20], are used to obtain nanoscale surface textures.…”