Increased ultraviolet reflectivity of magnetron deposited Al films

The change in optical and electrical characteristics of tin oxide films under the action of argon ion beam

“…It should be said, when the irradiation time is 13 -22 seconds, there is the increase in transmittance at wavelengths less than 360 nm and a slight increase in the infrared region. The increase in transmission, especially in the short-wavelengths region, of the irradiated films is related to the change of the plasma frequency [10][11][12]. This change is a consequence of the electrons concentration increasing.…”

“…However, the further irradiation time increase leads to the film resistance increase. This is, possibly, connected with the formation of Sn self-point defects [11][12]. Whereas, the point defects interact with all conductive electrons, so the electrons, located near the defects, are "bound" and do not participate in conductivity.…”

Influence of Crystal Defects on the Reflectivity of the Aluminum

“…Upon formation the crystallite structure may change as a result of plastic deformation, exposure to neutral or charged particle radiation, or electromagnetic radiation. Thus, the application of an assist ion beam when depositing film coatings leads to their structure modification, which in turn results in the modification of their optical properties [6,7,10,11].…”