2014
DOI: 10.1016/j.sse.2014.07.002
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Incremental resistance programming of programmable metallization cells for use as electronic synapses

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Cited by 37 publications
(25 citation statements)
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“…Memristors are promising candidates for both neuromorphic computing and next generation nonvolatile memory applications [1][2][3][4][5][6][7] because of their scalability [3,8] , 3D stacking potential [9][10][11] , and a close resemblance to the operating characteristics of synapses [1,4,7,12,13] . These applications typically require a large crossbar array of memristors, in which sneak path currents from neighboring cells during a write or read of a target cell can severely impede the proper operation of the array.…”
Section: Introductionmentioning
confidence: 99%
“…Memristors are promising candidates for both neuromorphic computing and next generation nonvolatile memory applications [1][2][3][4][5][6][7] because of their scalability [3,8] , 3D stacking potential [9][10][11] , and a close resemblance to the operating characteristics of synapses [1,4,7,12,13] . These applications typically require a large crossbar array of memristors, in which sneak path currents from neighboring cells during a write or read of a target cell can severely impede the proper operation of the array.…”
Section: Introductionmentioning
confidence: 99%
“…The spike-timing dependent plasticity (STDP) synaptic learning rule, inspired from the behavior of the biological neural system (Dayan and Abbott, 2001) and dominant in the brain, has been proposed and experimentally demonstrated with memristors acting as synapses by several groups over the past few years in many material systems, such as oxides (Yu et al, 2011; Wang et al, 2012a,b, 2016; Wu et al, 2012; Pickett et al, 2013; Mandal et al, 2014; Kim et al, 2015), chalcogenides (Li et al, 2013b; Mahalanabis et al, 2014a,b, 2016; La Barbera et al, 2015), silicon (Jo et al, 2010; Subramaniam et al, 2013), organic materials (Alibart et al, 2012; Li et al, 2013a; Cabaret et al, 2014; Luo et al, 2015), and even magnetic tunnel junctions (Krzysteczko et al, 2012). Illustrations of memristor effectiveness have also been shown in simulation and with transistor and/or complementary metal oxide semiconductor (CMOS)-based memristors (Rachmuth et al, 2011; Rose et al, 2011a,b; Cruz-Albrecht et al, 2012; Noack et al, 2015) and graphics processing units (Snider et al, 2011).…”
Section: Introductionmentioning
confidence: 99%
“…A layer of ternary GeSeAg is the ion source during operation. In contrast to other Ag-based GeSe or GeS ion-conducting device types (Mitkova and Kozicki, 2002; Kozicki and Mitkova, 2006; Kamalanathan et al, 2009; Waser et al, 2009; Wang et al, 2011; Mahalanabis et al, 2014a,b; Rajabi et al, 2015; Ielmini and Waser, 2016), no photodoping or thermal annealing steps are required, simplifying the fabrication steps, and producing more consistent device operation. These differences also enable the device used in this work to withstand higher fabrication (at least 300°C) and operating temperatures (operation at 150°C is routinely performed).…”
Section: Introductionmentioning
confidence: 99%
“…PMC also shows promise beyond von-Neumann computing. 17 Still early in its development, and with clear prospects for scaling down, PMC performance is likely to improve significantly in next-generation devices.…”
Section: Introductionmentioning
confidence: 99%