“…Different techniques for growing In 2 O 3 thin films have been reported, like pulsed laser deposition, , spray pyrolysis, chemical vapor deposition (CVD), ,, evaporation, cathodic electrodeposition, sputtering, thermal oxidation, and sol–gel , among which electrodeposition is a better choice. Electrodeposition is an attractive synthesis method because the growth parameters can easily be controlled to obtain thin films of diverse composition and properties; in addition, it is a low-temperature processing technique, the equipment and precursor materials are also inexpensive, and it has the capability to grow films on complex surfaces. − In most cases of electrodeposition of In 2 O 3 thin films, InCl 3 or In 2 (SO 4 ) 3 ·9H 2 O is used as the precursor, while stainless steel (ss), ITO/glass, and FTO/glass have been used as substrates. , The use of In 2 O 3 powder and titanium (Ti) foil as the source material and template in electrochemical deposition of In 2 O 3 thin films, however, has been scarcely explored.…”