Inductive coupling for increased bandwidth of aluminum nitride contour-mode microresonator filters

Nordquist, Christopher; Henry, Michael David; Nguyen, Janet; Clews, Peggy J.; Lepkowski, Stefan; Grine, Alejandro J.; Dyck, Christopher William; Olsson, Roy H.

doi:10.1109/mwsym.2016.7540057

Cited by 2 publications

(2 citation statements)

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“…However, new designs of contour mode resonators (CMR) have demonstrated the advantage of having a wide frequency range of devices on the same chip because the resonance is acoustically defined by the sidewalls of the device. This feature of CMRs is fundamentally different than BAWs where frequency is set by film thickness [4][5][6] . CMRs have been fabricated and packaged to demonstrate different frequency RF bandpass filters on the same chip 6,7 .…”

Section: Introductionmentioning

confidence: 99%

“…This feature of CMRs is fundamentally different than BAWs where frequency is set by film thickness [4][5][6] . CMRs have been fabricated and packaged to demonstrate different frequency RF bandpass filters on the same chip 6,7 . Every integration step to achieve these suspended acoustic devices, including lithographic patterning and plasma etching, is CMOS compatible and has been demonstrated in back end of the line (BEOL) integrations 8 .…”

Section: Introductionmentioning

confidence: 99%

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(Invited) AlN and ScAlN Contour Mode Resonators for RF Filters

et al. 2017

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Piezoelectric acoustic resonators are widely utilized for RF devices but most can only utilize a few different resonant frequencies on the same substrate. Contour mode resonators (CMR) have resonant frequencies defined lithographically offering the advantage of an extensive frequency range on the same film, wafer, or die. This work will discuss our efforts in developing ScAlN for CMRs to achieve RF performance suitable for use in RF filters. First we will discuss our RF sputter deposition process for creating high-performance Sc 0.12 Al 0.88 N piezoelectric films and compare it with an established sputtered piezoelectric AlN. Fabrication and integration techniques for fabricating CMRs will be then detailed. Finally, electrical design and resonator performance is then discussed. These early investigations into ScAlN films suggest that performance metrics such as k 2 eff can substantially improve while simultaneously ensuring good resonator Q factors over a wide frequency range of devices.

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