Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures

Cuxart, Marc G.; Šics, Igors; Goñi, Alejandro R.; Pach, Elzbieta; Sauthier, Guillaume; Paradinas, Markos; Foerster, Michael; Aballe, Lucía; Fernández, H. Moreno; Carlino, V.; Pellegrin, Eric

doi:10.1016/j.carbon.2017.02.067

Cited by 20 publications

(11 citation statements)

References 23 publications

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Section: Inductively Coupled Plasmamentioning

confidence: 99%

“…In the inductively coupled plasma (ICP) deposition, the ionized gas is obtained by coupling the electromagnetic field produced by a coil within the reaction chamber without the need for paired electrodes (Cuxart et al, 2017). The radiofrequency (RF)-ICP is a thermal plasma system which can perform thin films deposition in a wide variety of environments, such as oxidizing, reducing, inert, and many more reactive atmospheres (Cuxart et al, 2017). It is worth noting that ICP-PECVD configuration allows an extremely high purified environment appropriate for the synthesis of nanomaterials requiring accurate control of morphology and chemistries (Cuxart et al, 2017).…”

Section: Inductively Coupled Plasmamentioning

confidence: 99%

“…The radiofrequency (RF)-ICP is a thermal plasma system which can perform thin films deposition in a wide variety of environments, such as oxidizing, reducing, inert, and many more reactive atmospheres (Cuxart et al, 2017). It is worth noting that ICP-PECVD configuration allows an extremely high purified environment appropriate for the synthesis of nanomaterials requiring accurate control of morphology and chemistries (Cuxart et al, 2017). The ICP configuration is advantageous as compared to its counterpart due to its higher energy density capabilities; its setup is presented below in Figure 4.…”

Section: Inductively Coupled Plasmamentioning

confidence: 99%

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Advanced Development of Sustainable PECVD Semitransparent Photovoltaics: A Review

2021

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Energy is the driving force behind the upcoming industrial revolution, characterized by connected devices and objects that will be perpetually supplied with energy. Moreover, the global massive energy consumption increase requires appropriate measures, such as the development of novel and improved renewable energy technologies for connecting remote areas to the grid. Considering the current prominent market share of unsustainable energy generation sources, inexhaustible and clean solar energy resources offer tremendous opportunities that, if optimally exploited, might considerably help to lessen the ever-growing pressure experienced on the grid nowadays. The R&D drive to develop and produce socio-economically viable solar cell technologies is currently realigning itself to manufacture advanced thin films deposition techniques for Photovoltaic solar cells. Typically, the quest for the wide space needed to deploy PV systems has driven scientists to design multifunctional nanostructured materials for semitransparent solar cells (STSCs) technologies that can fit in available household environmental and architectural spaces. Specifically, Plasma Enhanced Chemical Vapor Deposition (PECVD) technique demonstrated the ability to produce highly transparent coatings with the desired charge carrier mobility. The aim of the present article is to review the latest semi-transparent PV technologies that were impactful during the past decade with special emphasis on PECVD-related technologies. We finally draw some key recommendations for further technological improvements and sustainability.

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Section: Inductively Coupled Plasmamentioning

confidence: 99%

Section: Inductively Coupled Plasmamentioning

confidence: 99%

Section: Inductively Coupled Plasmamentioning

confidence: 99%

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Advanced Development of Sustainable PECVD Semitransparent Photovoltaics: A Review

2021

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“…Another important parameter in ICP CVD is the pressure that influences the plasma energy, formation of active species and VOG growth process, which is not simply proportional to the pressure or gas flow rate because of the complex plasma chemistry process [66]. In addition, the higher substrate temperature enhances the surface reaction kinetics by increasing the nucleation sites on both the substrate and the as-grown VOG layers [67].…”

Section: Introductionmentioning

confidence: 99%

Properties of Nitrogen/Silicon Doped Vertically Oriented Graphene Produced by ICP CVD Roll-to-Roll Technology

Rozel¹,

Radziuk

Mikhnavets

et al. 2019

Coatings

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Simultaneous mass production of high quality vertically oriented graphene nanostructures and doping them by using an inductively coupled plasma chemical vapor deposition (ICP CVD) is a technological problem because little is understood about their growth mechanism over enlarged surfaces. We introduce a new method that combines the ICP CVD with roll-to-roll technology to enable the in-situ preparation of vertically oriented graphene by using propane as a precursor gas and nitrogen or silicon as dopants. This new technology enables preparation of vertically oriented graphene with distinct morphology and composition on a moving copper foil substrate at a lower cost. The technological parameters such as deposition time (1–30 min), gas partial pressure, composition of the gas mixture (propane, argon, nitrogen or silane), heating treatment (1–60 min) and temperature (350–500 °C) were varied to reveal the nanostructure growth, the evolution of its morphology and heteroatom’s intercalation by nitrogen or silicon. Unique nanostructures were examined by FE-SEM microscopy, Raman spectroscopy and energy dispersive X-Ray scattering techniques. The undoped and nitrogen- or silicon-doped nanostructures can be prepared with the full area coverage of the copper substrate on industrially manufactured surface defects. Longer deposition time (30 min, 450 °C) causes carbon amorphization and an increased fraction of sp3-hybridized carbon, leading to enlargement of vertically oriented carbonaceous nanostructures and growth of pillars.

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“…В то же время непосредственное воздействие плазмы может привести к образованию высокой плотности дефектов [8] в формируемых пленках и образованию вертикальных углеродных структур за счет собственного электрического поля [5]. Уменьшить образование дефектов и устранить вертикальный рост позволяет метод удаленного плазмо-химического осаждения, в котором реакционные камеры плазменной системы и установки ОГФ пространственно разделены, но совмещены потоки газов [9]. С другой стороны, такое совмещение усложняет установку для получения графена и увеличивает его стоимость.…”

Section: Introductionunclassified

Properties of Nanographite Formed by Plasma Deposition and Subsequent Heat Treatment

Neustroev¹,

Prokopiev²

2019

pcascnn

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Рецензирование статей осуществляется на основании Положения о рецензировании статей и материалов для опубликования в Межвузовском сборнике научных трудов «Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов». Официальный сайт издания в сети Интернет: https://www.physchemaspects.ru Ф50 Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов [Текст].  Тверь: Твер. гос. ун-т, 2019.  Вып. 11.  680 с. Зарегистрирован Федеральной службой по надзору в сфере связи, информационных технологий и массовых коммуникаций, свидетельство о регистрации СМИ ПИ № ФС 7747789 от 13.12.2011. Издание составлено из оригинальных статей, кратких сообщений и обзоров теоретического и экспериментального характера, отражающих результаты исследований в области изучения физико-химических процессов с участием кластеров, наноструктур и наноматериалов физики, включая межфазные явления и нанотермодинамику. Сборник предназначен для научных и инженерно-технических работников, преподавателей ВУЗов, студентов и аспирантов. Издание подготовлено на кафедре общей физики Тверского государственного университета. Переводное название: Physical and chemical aspects of the study of clusters, nanostructures and nanomaterials Транслитерация названия: Fiziko-himičeskie aspekty izučeniâ klasterov, nanostruktur i nanomaterialov

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Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures

Cited by 20 publications

References 23 publications

Advanced Development of Sustainable PECVD Semitransparent Photovoltaics: A Review

Advanced Development of Sustainable PECVD Semitransparent Photovoltaics: A Review

Properties of Nitrogen/Silicon Doped Vertically Oriented Graphene Produced by ICP CVD Roll-to-Roll Technology

Properties of Nanographite Formed by Plasma Deposition and Subsequent Heat Treatment

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