Industrial-scale sputter deposition of Cr1−xAlxN coatings with 0.21≤x≤0.74 from segmented targets

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

“…Another approach in an industrial context using the reactor CemeCon ® CC800/9 is the study of Weirather et al [86]. They used the Reactive Pulsed DC magnetron sputtering technique with triangle-like segmented targets.…”

Structural investigations of iron oxynitride multilayered films obtained by reactive gas pulsing process

“…In particular, these materials have attracted considerable interest because of their physical, optical and unique mechanical properties between those of oxides and nitrides [1][2][3][4]. Indeed the transition metal nitrides are known for their excellent mechanical properties [5,6], such as their ability to improve surface hardness and wear resistance while the transition metal oxides are mainly used for their optical devices [7]. In this regard, the ratio of oxygen to nitrogen enables the preparation of oxynitride films with a multitude of atomic compositions.…”

Increased thermal stability of Ti1−xAlxN/TiN multilayer coatings through high temperature sputter deposition on powder-metallurgical high-speed steels

“…Two-fold rotation at a speed of 1 rpm was applied for the PM-HSS disks and Si, while the end mills were coated under three-fold rotation. As a consequence of both substrate rotation and target configuration [29,30], which implies differing sputter emission distributions from the Ti-Al targets and the Ti target [31,32], the formation of a compositionally modulated structure as obtained by Chen et al [22] can be anticipated. The substrate temperatures during coating deposition were varied from 375 to 575°C in five deposition runs and measured by positive temperature coefficient resistors at lower temperatures and by a pyrometer at higher temperatures.…”