Inelastic electron scattering and energy-selective negative ion reactions in molecular films on silicon surfaces

Lane, Chirstopher D.; Orlando, Thomas M.

doi:10.1016/j.apsusc.2007.02.002

Cited by 11 publications

(9 citation statements)

References 112 publications

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“…The physics of electron impact on molecular targets (here symbolized by AB) is nowadays rather well-described on a theoretical point of view (see Figure 2) [72]. However, the complete set of cross-sections associated to the different interactions of secondary electrons with large molecules like PADC still remains unknown.…”

Section: Physical Stagementioning

confidence: 99%

Role of intermediate species in the formation of ion tracks in PADC: A review

Fromm

Kodaira

Kusumoto

et al. 2019

Polymer Degradation and Stability

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Section: Physical Stagementioning

confidence: 99%

Role of intermediate species in the formation of ion tracks in PADC: A review

Fromm

Kodaira

Kusumoto

et al. 2019

Polymer Degradation and Stability

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“…Figure 13 also shows that there is a small peak around 18 eV, an energy that seems to be too high for dissociative electron attachment, which usually occurs below 12-15 eV. 23 The peak is unlikely to be due to dipolar dissociation or direct electron impact ionization, which are nonresonant scattering processes and show a smooth increase in tot above a threshold energy between 10 and 20 eV. 24 A possible explanation is that this peak is caused by a resonant process involving SEs generated by the interaction of the PEs with the substrate.…”

Section: E Influence Of Incident Electron Energy On the Total Reactimentioning

confidence: 99%

Electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV): Total cross section as a function of incident electron energy

Dorp

Wnuk

Gorham

et al. 2009

Journal of Applied Physics

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Electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV): Total cross section as a function of incident electron energyCite as: J. Appl. Phys. 106, 074903 (2009) The total cross section has been measured for the electron induced dissociation of trimethyl ͑methylcyclopentadienyl͒ platinum ͑IV͒ ͓MeCpPt͑IV͒Me 3 ͔, a Pt precursor often used in focused electron beam induced processing ͑FEBIP͒, for incident electron energies ranging between 3-3 keV. Measurements were performed for the precursor in the adsorbed state under ultrahigh vacuum conditions. The techniques used in this study were temperature programmed desorption, x-ray photoelectron spectroscopy and mass spectrometry. Two surfaces were used in these experiments, amorphous carbon overlayers containing embedded Pt atoms ͑a:C-Pt͒, formed by the electron decomposition of the Pt precursor, and atomically clean Au. The results from these three experiments revealed a comparatively low total cross section at 8 eV ͑4.2Ϯ 0.3ϫ 10 −17 cm 2 on the a:C-Pt and 1.4Ϯ 0.1ϫ 10 −17 cm 2 on the Au͒ that increases with increasing incident electron energy, reaching a maximum at around 150 eV ͑4.1Ϯ 0.5ϫ 10 −16 cm 2 on the a:C-Pt and 2.3Ϯ 0.2 ϫ 10 −16 cm 2 on the clean Au͒, before decreasing at higher incident electron energies, up to 3000 eV. Differences in the measured cross sections between Au and a:C-Pt surfaces demonstrate that the substrate can influence the reaction cross section of adsorbed species. Temperature programmed desorption was also used to measure the adsorption energy of MeCpPt͑IV͒Me 3 , which was found to depend on both the substrate and the adsorbate coverage. The work in this paper demonstrates that surface science techniques can be used to quantitatively determine the total cross section of adsorbed FEBIP precursors for electron induced dissociation as a function of incident electron energy. These total cross section values are necessary to obtain quantitatively accurate information from FEBIP models and to compare the reaction efficiencies of different precursors on a quantitative basis.

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“…44 Nonetheless, using gas phase cross sections is a valid approach, in order to elucidate the different processes occurring at the surface (for a review on the subject, see Ref. 45), and DI cross sections have been successfully adapted for use in MC simulations (e.g., see Refs. 29 and 27).…”

Section: No]mentioning

confidence: 99%

Absolute cross sections for dissociative electron attachment and dissociative ionization of cobalt tricarbonyl nitrosyl in the energy range from 0 eV to 140 eV

Engmann

Staňo

Papp

et al. 2013

The Journal of Chemical Physics

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The following article appeared as: Engmann, S., Stano, M., Papp, P., Brunger, M.J., Matejcik, S. and Ingolfsson, O., 2013. Absolute cross sections for dissociative electron attachment and dissociative ionization of cobalt tricarbonyl nitrosyl in the energy range from 0 eV to 140 eV. We report absolute dissociative electron attachment (DEA) and dissociative ionization (DI) cross sections for electron scattering from the focused electron beam induced deposition (FEBID) precursor Co(CO) 3 NO in the incident electron energy range from 0 to 140 eV. We find that DEA leads mainly to single carbonyl loss with a maximum cross section of 4.1 × 10 −16 cm 2 , while fragmentation through DI results mainly in the formation of the bare metal cation Co + with a maximum cross section close to 4.6 × 10 −16 cm 2 at 70 eV. Though DEA proceeds in a narrow incident electron energy range, this energy range is found to overlap significantly with the expected energy distribution of secondary electrons (SEs) produced in FEBID. The DI process, on the other hand, is operative over a much wider energy range, but the overlap with the expected SE energy distribution, though significant, is found to be mainly in the threshold region of the individual DI processes.

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Inelastic electron scattering and energy-selective negative ion reactions in molecular films on silicon surfaces

Cited by 11 publications

References 112 publications

Role of intermediate species in the formation of ion tracks in PADC: A review

Role of intermediate species in the formation of ion tracks in PADC: A review

Electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV): Total cross section as a function of incident electron energy

Absolute cross sections for dissociative electron attachment and dissociative ionization of cobalt tricarbonyl nitrosyl in the energy range from 0 eV to 140 eV

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